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1. (WO2018089587) SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS

Pub. No.:    WO/2018/089587    International Application No.:    PCT/US2017/060782
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Fri Nov 10 00:59:59 CET 2017
IPC: B08B 9/00
C23C 16/00
Applicants: TOKYO ELECTRON LIMITED
LANE, Barton, G.
EIBAGI, Nasim
RANJAN, Alok
VENTZEK, Peter, L.G.
Inventors: LANE, Barton, G.
EIBAGI, Nasim
RANJAN, Alok
VENTZEK, Peter, L.G.
Title: SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS
Abstract:
Embodiments of the disclosure describe a cyclic etch method for carbon-based films. According to one embodiment, the method includes providing a substrate containing the carbon-based film, exposing the carbon-based film to an oxidizing plasma thereby forming an oxidized layer on the carbon-based film, thereafter, exposing the oxidized layer to a non- oxidizing inert gas plasma thereby removing the oxidized layer and forming a carbonized surface layer on the carbon-based film, and repeating the exposing steps at least once.