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1. (WO2018089487) REMOVAL OF MOISTURE FROM HYDRAZINE

Pub. No.:    WO/2018/089487    International Application No.:    PCT/US2017/060629
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Thu Nov 09 00:59:59 CET 2017
IPC: B01D 53/02
B01D 53/26
Applicants: MATHESON TRI-GAS, INC.
Inventors: SHIMIZU, Hideharu
RAYNOR, Mark, W.
TEMPEL, Daniel, J.
GARDINER, Robin
ALVAREZ, JR., Daniel
Title: REMOVAL OF MOISTURE FROM HYDRAZINE
Abstract:
The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).