Search International and National Patent Collections

1. (WO2018089444) SYSTEMS AND METHODS OF DISLOCATION FILTERING FOR LAYER TRANSFER

Pub. No.:    WO/2018/089444    International Application No.:    PCT/US2017/060568
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Thu Nov 09 00:59:59 CET 2017
IPC: H01L 21/683
H01L 21/306
Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
Inventors: KIM, Jeehwan
LEE, Kyusang
Title: SYSTEMS AND METHODS OF DISLOCATION FILTERING FOR LAYER TRANSFER
Abstract:
A method of manufacturing a semiconductor device includes forming a first epitaxial layer on a first substrate. The first substrate includes a first semiconductor material having a first lattice constant and the first epitaxial layer includes a second semiconductor material having a second lattice constant different from the first lattice constant. The method also includes disposing a graphene layer on the first epitaxial layer and forming a second epitaxial layer comprising the second semiconductor material on the graphene layer. This method can increase the substrate reusability, increase the release rate of functional layers, and realize precise control of release thickness.