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1. (WO2018089428) MAGNETICALLY LEVITATED AND ROTATED CHUCK FOR PROCESSING MICROELECTRONIC SUBSTRATES IN A PROCESS CHAMBER

Pub. No.:    WO/2018/089428    International Application No.:    PCT/US2017/060543
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Thu Nov 09 00:59:59 CET 2017
IPC: H01L 21/687
H01L 21/683
H01L 21/67
H01L 21/02
Applicants: TEL FSI, INC.
Inventors: INHOFER, William P.
MOORE, Sean
VAN ELSEN, Lance
Title: MAGNETICALLY LEVITATED AND ROTATED CHUCK FOR PROCESSING MICROELECTRONIC SUBSTRATES IN A PROCESS CHAMBER
Abstract:
Cleaning systems and methods for semiconductor fabrication use rotatable and optionally translatable chuck assemblies that incorporate magnetic levitation and rotation functionality to cause chuck rotation. The rotating chuck components do not physically contact other chuck components when levitated and rotating. This eliminates corresponding components whose friction or lubricants might generate contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments. By avoiding the use of lubricants for this rotating interface, process chambers can be evacuated and/or vented up to higher pressures much faster. This significantly reduces cycle time for cryogenic treatments.