Search International and National Patent Collections

1. (WO2018089180) PLASMA LIGHT UP SUPPRESSION

Pub. No.:    WO/2018/089180    International Application No.:    PCT/US2017/057454
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Fri Oct 20 01:59:59 CEST 2017
IPC: H01L 21/683
H01L 21/67
H01J 37/32
H01L 21/02
H01L 21/3065
Applicants: LAM RESEARCH CORPORATION
Inventors: NI, Pavel
Title: PLASMA LIGHT UP SUPPRESSION
Abstract:
A method for suppressing arcing in helium distribution channels of an electrostatic chuck in a plasma processing chamber, wherein the electrostatic chuck is connected to a voltage source for providing a chucking voltage and wherein the plasma processing chamber comprises a process gas source, and a plasma power source for transforming the process gas into a plasma is provided. A gas is flowed through the helium distribution channels of an electrostatic chuck to a back side of a wafer. The gas comprises helium and an electronegative gas.