Search International and National Patent Collections
|1. (WO2018088720) NOTCH POLISHING PAD DRESSING DEVICE AND METHOD FOR MANUFACTURING WAFER USING SAME DEVICE|
|Applicants:||SK SILTRON CO., LTD.
|Inventors:||LEE, Yong Dae
KIM, Soo Jin
|Title:||NOTCH POLISHING PAD DRESSING DEVICE AND METHOD FOR MANUFACTURING WAFER USING SAME DEVICE|
A notch polishing pad dressing device for dressing a notch polishing pad for polishing a notch portion of a wafer according to an embodiment comprises: a body; a bonding layer arranged on the body and containing a metallic material; a coating layer coated on the surface of the bonding layer; and a cutting material, which is fixedly attached to the body by the bonding layer, protrudes from the upper face of the coating layer, and is attached to a notch polishing pad to dress the notch polishing pad.