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1. (WO2018088550) DIRECT IMAGING EXPOSURE DEVICE AND DIRECT IMAGING EXPOSURE METHOD

Pub. No.:    WO/2018/088550    International Application No.:    PCT/JP2017/040719
Publication Date: Fri May 18 01:59:59 CEST 2018 International Filing Date: Tue Nov 14 00:59:59 CET 2017
IPC: G03F 7/20
Applicants: ADTEC ENGINEERING CO., LTD.
株式会社アドテックエンジニアリング
Inventors: SUZUKI Shoji
鈴木 昌治
Title: DIRECT IMAGING EXPOSURE DEVICE AND DIRECT IMAGING EXPOSURE METHOD
Abstract:
[Problem] To enable resolution to be effectively increased beyond a conventional resolution limit such that the pattern of applied light approaches a designed exposure pattern as much as possible. [Solution] Light in an exposure pattern is applied to an exposure area E by an exposure unit provided with a spatial light modulator that is a DMD, and while an object W is being moved through the exposure area E by a moving mechanism, a photosensitive layer at the surface of the object W is exposed by applying light having a critical exposure amount or more thereto. A point to be exposed of the object W is located at corresponding coordinates G corresponding to a pixel mirror in an on state of the spatial light modulator at multiple times and multiply exposed. The number of times of multiple exposure at an exposure point the distance of which to the boundary of a designed exposure pattern is less than an exposure point pitch is smaller than a maximum number of times set according to the distance to the boundary.