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1. (WO2018087485) METHOD FOR THE COLLECTIVE PRODUCTION OF A PLURALITY OF OPTOELECTRONIC CHIPS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/087485 International Application No.: PCT/FR2017/053067
Publication Date: 17.05.2018 International Filing Date: 10.11.2017
IPC:
G02B 6/42 (2006.01) ,G02B 6/12 (2006.01)
Applicants: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES[FR/FR]; Bâtiment le Ponant D 25 rue Leblanc 75015 PARIS, FR
Inventors: MENEZO, Sylvie; FR
FOURNEL, Frank; FR
Agent: LE GOALLER, Christophe; FR
DUPONT, Jean-Baptiste; FR
COLOMBO, Michel; FR
Priority Data:
166096714.11.2016FR
Title (EN) METHOD FOR THE COLLECTIVE PRODUCTION OF A PLURALITY OF OPTOELECTRONIC CHIPS
(FR) PROCEDE DE REALISATION COLLECTIVE D'UNE PLURALITE DE PUCES OPTOELECTRONIQUES
Abstract: front page image
(EN) The invention relates to a method for the collective production of a plurality of optoelectronic chips (P1, P2), comprising the following steps: i) supplying a receiving substrate (1) comprising a plurality of zones called elementary zones (z1, z2), each one comprising at least one waveguide called a coupling waveguide (31, 32) built into the receiving substrate (1); ii) transferring a plurality of contact plates (6) to the elementary zones (z1, z2) such that the contact plates (6) partially cover the coupling waveguides (31, 32); and iii) producing said first optoelectronic components (21, 22) from said contact plates (6); characterised in that, following the transfer stage, each contact plate (6) extends over an assembly (E) of at least two adjacent elementary zones (z1, z2).
(FR) L'invention porte sur un procédé de réalisation collective d'une pluralité de puces optoélectroniques (P1, P2), comportant les étapes suivantes : i) fourniture d'un substrat de réception (1), comportant une pluralité de zones dites élémentaires (z1, z2), chacune comportant au moins un guide d'onde dit de couplage (31, 32), intégré dans le substrat de réception (1); ii) report d'une pluralité de plots (6) sur les zones élémentaires (z1, z2), de sorte que les plots (6) recouvrent partiellement les guides d'onde de couplage (31, 32); iii) réalisation desdits premiers composants optoélectronique (21, 22) à partir desdits plots (6); caractérisé en ce que, à la suite de l'étape de report, chaque plot (6) s'étend sur un ensemble (E) d'au moins deux zones élémentaires adjacentes (z1, z2).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)