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1. (WO2018087120) DEVICE AND METHOD TO CONTROL THE UNIFORMITY OF A GAS FLOW IN A CVD OR AN ALD REACTOR OR OF A LAYER GROWN THEREIN
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Pub. No.: WO/2018/087120 International Application No.: PCT/EP2017/078548
Publication Date: 17.05.2018 International Filing Date: 08.11.2017
IPC:
C23C 16/455 (2006.01) ,C23C 16/458 (2006.01) ,C23C 16/52 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
458
characterised by the method used for supporting substrates in the reaction chamber
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
52
Controlling or regulating the coating process
Applicants: AIXTRON SE[DE/DE]; Dornkaulstraße 2 52134 Herzogenrath, DE
Inventors: KIM, Gi Youl; US
LIN, Mark Chen-lun; US
SIU, Gregory; US
PARK, Ki Chul; KR
MOHN, Jonathan David; US
LUCAS JR., H. William; US
Agent: GRUNDMANN, Dirk; DE
MÜLLER, Enno; DE
RIEDER, Hans-Joachim; DE
BRÖTZ, Helmut; DE
BOURREE, Hendrik; DE
Priority Data:
15/348,88310.11.2016US
Title (EN) DEVICE AND METHOD TO CONTROL THE UNIFORMITY OF A GAS FLOW IN A CVD OR AN ALD REACTOR OR OF A LAYER GROWN THEREIN
(FR) DISPOSITIF ET PROCÉDÉ PERMETTANT DE RÉGULER L'UNIFORMITÉ D'UN FLUX DE GAZ DANS UN RÉACTEUR DE DÉPÔT CHIMIQUE EN PHASE VAPEUR (CVD) OU DE DÉPÔT EN COUCHES ATOMIQUES (ALD) OU D'UNE COUCHE CULTIVÉE DANS CELUI-CI
Abstract:
(EN) A measuring device is provided for determining the position of a susceptor in a reactor housing. The measuring device includes a central element, which can be fastened on the susceptor at a predefined location, and a plurality of sensing arms, which protrude from the central element beyond an outer periphery of the susceptor. The sensing arms respectively include a sensing section that can be brought in touching contact with a contact zone. The contact zone is formed byan inner periphery of the reactor housing or a component arranged in the reactor housing. Using the measuring device, the position of a susceptor of a CVD reactor is determined relative to the reactor housing or a component arranged in the reactor housing.
(FR) Un dispositif de mesure permet de déterminer la position d'un suscepteur dans une cuve de réacteur. Le dispositif de mesure comprend un élément central qui peut être fixé sur le suscepteur à un emplacement prédéfini, et une pluralité de bras de détection qui font saillie hors de l'élément central et au-delà de la périphérie extérieure du suscepteur. Les bras de détection comprennent respectivement une section de détection qui peut être amenée au contact d'une zone de contact. La zone de contact est formée par la périphérie intérieure de la cuve de réacteur ou par un composant disposé dans la cuve de réacteur. À l'aide du dispositif de mesure, la position d'un suscepteur d'un réacteur CVD est déterminée par rapport à la cuve de réacteur ou à un composant disposé dans la cuve de réacteur.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)