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1. (WO2018086320) BLUE COLOR-RESIST, COLOR FILM SUBSTRATE, AND LIQUID CRYSTAL DISPLAY
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Pub. No.: WO/2018/086320 International Application No.: PCT/CN2017/082830
Publication Date: 17.05.2018 International Filing Date: 03.05.2017
IPC:
G02F 1/1335 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/027 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Applicants: BOE TECHNOLOGY GROUP CO., LTD.[CN/CN]; No. 10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.[CN/CN]; Xinzhan Industrial Park Hefei, Anhui 230012, CN
Inventors: YUAN, Huifang; CN
YUK, Sangman; CN
ZHU, Tao; CN
TANG, Wenhao; CN
YIN, Haibin; CN
DONG, Anxin; CN
ZHONG, Guoqiang; CN
FANG, Qun; CN
CHEN, Jian; CN
YU, Ya; CN
YIN, Rui; CN
Agent: TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS; CHEN, Yuan 10th Floor, Tower D, Minsheng Financial Center 28 Jianguomennei Avenue, Dongcheng District Beijing 100005, CN
Priority Data:
201611023844.314.11.2016CN
Title (EN) BLUE COLOR-RESIST, COLOR FILM SUBSTRATE, AND LIQUID CRYSTAL DISPLAY
(FR) RÉSERVE DE COULEUR BLEUE, SUBSTRAT DE FILM COLORÉ ET DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES
Abstract:
(EN) A blue color-resist for a liquid crystal display. The blue color-resist contains a blue pigment and a green pigment. A wavelength of a blue light after being transmitted through the blue color-resist is shifted toward infrared region.
(FR) L'invention concerne une réserve de couleur bleue d'un dispositif d'affichage à cristaux liquides. La réserve de couleur bleue contient un pigment bleu et un pigment vert. Une longueur d'onde d'une lumière bleue ayant traversé la réserve de couleur bleue est décalée vers la région infrarouge.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)