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1. (WO2018086300) METHOD FOR FORMING SLANTING FACE AT SURFACE OF SUBSTRATE
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Pub. No.: WO/2018/086300 International Application No.: PCT/CN2017/078831
Publication Date: 17.05.2018 International Filing Date: 30.03.2017
IPC:
B81C 1/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
81
MICRO-STRUCTURAL TECHNOLOGY
C
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
1
Manufacture or treatment of devices or systems in or on a substrate
Applicants: SHANGHAI INDUSTRIAL ΜTECHNOLOGY RESEARCH INSTITUTE[CN/CN]; Building 3 No. 235 Chengbei Rd, Jiading District Shanghai 201800, CN
Inventors: DING, Liusheng; CN
Agent: BEIJING ORIGINTELLIGENCE IP LAW FIRM; LIU, Yuanxia Room 705, Tower E, Jiahua Building No. 9, Shangdi 3rd Street, Haidian District Beijing 100085, CN
Priority Data:
201611029732.914.11.2016CN
Title (EN) METHOD FOR FORMING SLANTING FACE AT SURFACE OF SUBSTRATE
(FR) PROCÉDÉ DE FORMATION D'UNE FACE INCLINÉE AU NIVEAU DE LA SURFACE D'UN SUBSTRAT
(ZH) 在基体的表面形成斜面的方法
Abstract:
(EN) A method for forming a slanting face at a surface of a substrate comprises: employing a size change of a material in an oxidization process to cause a flat face to slant with respect to a surface of a substrate (200), thereby forming a slanting face (208). An angle of the slanting face (208) is controllable. The slanting face (208) has favorable flatness.
(FR) Procédé de formation d'une face inclinée au niveau d'une surface d'un substrat comprenant : l'emploi d'un changement de taille d'un matériau dans un processus d'oxydation pour amener une face plate à s'incliner par rapport à une surface d'un substrat (200), formant de ce fait une face inclinée (208). Un angle de la face inclinée (208) peut être commandé. La face inclinée (208) présente une planéité favorable.
(ZH) 一种在基体的表面形成斜面的方法,利用材料在氧化过程中尺寸的变化,使平面相对于基体(200)的表面发生倾斜,从而形成斜面(208),斜面(208)角度可控,斜面(208)平整度较高。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)