WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2018085559) SYSTEM AND METHOD FOR SELECTING COLONIES
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/085559    International Application No.:    PCT/US2017/059745
Publication Date: 11.05.2018 International Filing Date: 02.11.2017
IPC:
C12M 1/00 (2006.01), C12M 1/16 (2006.01), C12M 1/22 (2006.01), G06T 5/40 (2006.01), G01N 21/31 (2006.01)
Applicants: BECTON, DICKINSON AND COMPANY [US/US]; 1 Becton Drive Franklin Lakes, NJ 07417 (US)
Inventors: NICOLSON, Strett, Roger; (US).
SAKOWSKI, Mark; (US).
FIENI, Paul; (US).
KARSEB, Mark; (US).
AMAN, Keri Lynne, Jones; (US).
LLANSO, Amy, Alcott; (US).
CHOU, Harry, Yuheng; (US)
Agent: FULLER, Michael, L.; (US)
Priority Data:
62/417,942 04.11.2016 US
Title (EN) SYSTEM AND METHOD FOR SELECTING COLONIES
(FR) SYSTÈME ET PROCÉDÉ POUR SÉLECTIONNER DES COLONIES
Abstract: front page image
(EN)Systems and methods are provided for selecting colony locations. Selecting colony locations can include determine a location of a selection tool on a culture plate image, determining a location of a potential source of error on the culture plate image, comparing the location of the selection tool to the location of the potential source of error; and determining an error when the location of the selection tool overlays the location of the potential source of error.
(FR)La présente invention concerne des systèmes et des procédés pour sélectionner des emplacements de colonie. La sélection d'emplacements de colonie peut comprendre la détermination d'un emplacement d'un outil de sélection sur une image de plaque de culture, la détermination d'un emplacement d'une source potentielle d'erreur sur l'image de plaque de culture, la comparaison de l'emplacement de l'outil de sélection à l'emplacement de la source potentielle d'erreur, et la détermination d'une erreur lorsque l'emplacement de l'outil de sélection recouvre l'emplacement de la source potentielle d'erreur.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)