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1. (WO2018085105) CARRIER PLATE FOR USE IN PLASMA PROCESSING SYSTEMS

Pub. No.:    WO/2018/085105    International Application No.:    PCT/US2017/058461
Publication Date: Sat May 12 01:59:59 CEST 2018 International Filing Date: Fri Oct 27 01:59:59 CEST 2017
IPC: C23C 16/458
C23C 16/50
Applicants: LAM RESEARCH CORPORATION
Inventors: LEESER, Karl
Title: CARRIER PLATE FOR USE IN PLASMA PROCESSING SYSTEMS
Abstract:
A carrier plate for receiving a wafer includes a pocket defined in a middle section on a top surface of the carrier plate and has a surface diameter. The pocket defines a substrate support region. A retaining feature of the carrier plate is defined at an outer edge of the pocket. A tapered portion of the carrier plate extends from the retaining feature to an outer diameter. The tapered portion is configured to receive a focus ring. A bottom surface of the carrier plate is configured to sit over a pedestal that is used in a process chamber. A plurality of wafer supports is disposed on a top surface of the substrate support region to support the wafer, when received.