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1. (WO2018080056) POLYIMIDE-BASED BLOCK COPOLYMER AND POLYIMIDE-BASED FILM COMPRISING SAME
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Pub. No.: WO/2018/080056 International Application No.: PCT/KR2017/011254
Publication Date: 03.05.2018 International Filing Date: 12.10.2017
IPC:
C08G 73/10 (2006.01) ,C08L 79/08 (2006.01) ,C08J 5/18 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
73
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups C08G12/-C08G71/238
06
Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
10
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
79
Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08L61/-C08L77/259
04
Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
08
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
Applicants:
주식회사 엘지화학 LG CHEM, LTD. [KR/KR]; 서울시 영등포구 여의대로 128 128, Yeoui-daero, Yeongdeungpo-gu, Seoul 07336, KR
Inventors:
최성열 CHOI, Sung Yeol; KR
김병국 KIM, Byung Guk; KR
김상곤 KIM, Sang Gon; KR
장덕훈 JANG, Duk Hun; KR
최형삼 CHOI, Hyung Sam; KR
Agent:
유미특허법인 YOU ME PATENT AND LAW FIRM; 서울시 강남구 테헤란로 115 115 Teheran-ro Gangnam-gu Seoul 06134, KR
Priority Data:
10-2016-013856524.10.2016KR
10-2017-012964011.10.2017KR
Title (EN) POLYIMIDE-BASED BLOCK COPOLYMER AND POLYIMIDE-BASED FILM COMPRISING SAME
(FR) COPOLYMÈRE SÉQUENCÉ À BASE DE POLYIMIDE ET FILM À BASE DE POLYIMIDE LE COMPRENANT
(KO) 폴리이미드계 블록 공중합체 및 이를 포함하는 폴리이미드계 필름
Abstract:
(EN) The present invention relates to a polyimide-based block copolymer and a polyimide-based film comprising the same. The polyimide-based block copolymer according to the present invention has a high molecular weight and enables a colorless and transparent polyimide-based film to be provided.
(FR) La présente invention concerne un copolymère séquencé à base de polyimide et un film à base de polyimide le comprenant. Le copolymère séquencé à base de polyimide selon la présente invention possède un poids moléculaire élevé et permet de fournir un film à base de polyimide incolore et transparent.
(KO) 본 발명은 폴리이미드계 블록 공중합체 및 이를 포함하는 폴리이미드계 필름에 관한 것이다. 본 발명에 따른 폴리이미드계 블록 공중합체는 큰 분자량을 가지며, 무색 투명한 폴리이미드계 필름의 제공을 가능케 한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)