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1. (WO2018079525) FUNCTIONAL FILM

Pub. No.:    WO/2018/079525    International Application No.:    PCT/JP2017/038287
Publication Date: Fri May 04 01:59:59 CEST 2018 International Filing Date: Wed Oct 25 01:59:59 CEST 2017
IPC: G02B 1/118
B32B 3/30
B32B 27/30
C08G 65/22
C08G 65/32
G02B 1/18
Applicants: DAIKIN INDUSTRIES, LTD.
ダイキン工業株式会社
Inventors: YAMASHITA, Tsuneo
山下 恒雄
SAKAMOTO, Eiji
阪本 英司
NII, Saya
新居 沙弥
SAKAKURA, Atsushi
坂倉 淳史
Title: FUNCTIONAL FILM
Abstract:
Provided is a functional film which has a desired microrelief pattern structure, while having excellent antifouling properties, water repellency and oil repellency, and wherein the characteristics of a resin serving as a base material that imparts the functional film with a function are sufficiently exhibited. This functional film comprises a layer (A) that contains a resin and a layer (B) that contains a compound having a perfluoropolyether group, and is characterized in that: a surface of the layer (B) has a microrelief pattern structure, said surface being on the reverse side of the layer (A)-side surface; relational expression (1) is satisfied in cases where an elemental analysis is carried out by X-ray photoelectron spectroscopy, while etching the functional film from the layer (B) side by means of an argon gas cluster ion beam; and relational expression (2) is satisfied in cases where the carbon 1s spectrum is measured by X-ray photoelectron spectroscopy, while etching the functional film from the layer (B) side by means of an argon gas cluster ion beam. Relational expression (1): D1 < 2 × X1 (In the formula, X1 represents the film thickness (nm) of the layer (B); and D1 represents the depth (nm) at which the fluorine atom concentration falls to 1 atom% or less.) Relational expression (2): D2 < 2 × X1 (In the formula, X1 represents the film thickness (nm) of the layer (B); and D2 represents the depth (nm) at which a peak is not detected within a binding energy range of from 290 eV to 300 eV.)