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1. (WO2018079203) METHOD FOR PRODUCING RESIN, AND METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION

Pub. No.:    WO/2018/079203    International Application No.:    PCT/JP2017/035839
Publication Date: Fri May 04 01:59:59 CEST 2018 International Filing Date: Tue Oct 03 01:59:59 CEST 2017
IPC: C08F 8/12
C08F 212/14
C08F 220/16
C08F 224/00
G03F 7/038
G03F 7/039
G03F 7/20
Applicants: FUJIFILM CORPORATION
富士フイルム株式会社
Inventors: KANEKO Akihiro
金子 明弘
HIRANO Shuji
平野 修史
NIHASHI Wataru
二橋 亘
Title: METHOD FOR PRODUCING RESIN, AND METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION
Abstract:
Provided are: a method for producing a resin, whereby it becomes possible to produce a resin that enables the formation of a resist film having excellent resolution and also enables the reduction in scums during the formation of a pattern; and a method for producing an active ray-sensitive or radiation-sensitive composition. The method for producing a resin comprises: a first step of producing a resin containing a repeating unit represented by general formula (1) and a repeating unit containing a group capable of generating a polar group upon being decomposed by the action of an acid, thereby producing a resin precursor containing a repeating unit represented by general formula (2) and a repeating unit containing a group capable of generating a polar group upon being decomposed by the action of an acid; and a second step of deprotecting a group represented by -OY in the repeating unit represented by general formula (2) in the resin precursor with an acid or a base to produce a repeating unit represented by general formula (1).