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1. (WO2018078929) PATTERN FORMING METHOD, BASE AGENT AND LAMINATE
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Pub. No.: WO/2018/078929 International Application No.: PCT/JP2017/020103
Publication Date: 03.05.2018 International Filing Date: 30.05.2017
IPC:
B05D 7/24 (2006.01) ,B05D 1/36 (2006.01) ,B32B 27/28 (2006.01) ,B32B 27/30 (2006.01) ,C08F 293/00 (2006.01) ,C09D 5/00 (2006.01) ,C09D 125/04 (2006.01) ,C09D 133/04 (2006.01) ,C09D 133/14 (2006.01) ,C09D 153/00 (2006.01) ,H01L 21/027 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
7
Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
24
for applying particular liquids or other fluent materials
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Processes for applying liquids or other fluent materials
36
Successively applying liquids or other fluent materials, e.g. without intermediate treatment
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
28
comprising copolymers of synthetic resins not wholly covered by any one of the following subgroups
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
30
comprising vinyl resin; comprising acrylic resin
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
293
Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5
Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
125
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
02
Homopolymers or copolymers of hydrocarbons
04
Homopolymers or copolymers of styrene
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04
Homopolymers or copolymers of esters
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04
Homopolymers or copolymers of esters
14
of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
153
Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants:
王子ホールディングス株式会社 OJI HOLDINGS CORPORATION [JP/JP]; 東京都中央区銀座四丁目7番5号 7-5, Ginza 4-chome, Chuo-ku, Tokyo 1040061, JP
Inventors:
森田 和代 MORITA Kazuyo; JP
服部 貴美子 HATTORI Kimiko; JP
Agent:
特許業務法人特許事務所サイクス SIKS & CO.; 東京都中央区京橋一丁目8番7号 京橋日殖ビル8階 8th Floor, Kyobashi-Nisshoku Bldg., 8-7, Kyobashi 1-chome, Chuo-ku, Tokyo 1040031, JP
Priority Data:
2016-21235228.10.2016JP
Title (EN) PATTERN FORMING METHOD, BASE AGENT AND LAMINATE
(FR) PROCÉDÉ DE FORMATION DE MOTIF, AGENT DE BASE ET STRATIFIÉ
(JA) パターン形成方法、下地剤及び積層体
Abstract:
(EN) A pattern forming method which comprises a step for applying a base agent onto a substrate and a step for applying a self-assembling composition for pattern formation onto a substrate surface to which the base agent has been applied, thereby forming a self-assembled film by means of self-assembling phase separation, and wherein the self-assembling composition for pattern formation contains a block copolymer which comprises a polymer moiety a that has at least one of the structures represented by formula (103) or formula (104) and a polymer moiety b that has a structure represented by formula (105), while having a sugar moiety content of from 3% by mass to 80% by mass (inclusive). A base agent which contains a polymer comprising at least one unit selected from among optionally substituted units derived from (meth)acrylates and optionally substituted units derived from styrene, and which is used for the purpose of causing a phase separation of a self-assembling composition for pattern formation containing a block copolymer which comprises a polymer moiety a that has at least one of the structures represented by formula (103) or formula (104) and a polymer moiety b that has a structure represented by formula (105), while having a sugar moiety content of from 3% by mass to 80% by mass (inclusive). A laminate which sequentially comprises, in the following order, a substrate, a base layer that contains a polymer comprising at least one unit selected from among optionally substituted units derived from (meth)acrylates and optionally substituted units derived from styrene, and a pattern formation layer that contains a block copolymer which comprises a polymer moiety a that has at least one of the structures represented by formula (103) or formula (104) and a polymer moiety b that has a structure represented by formula (105), while having a sugar moiety content of from 3% by mass to 80% by mass (inclusive).
(FR) La présente invention concerne un procédé de formation de motif qui comprend une étape consistant à appliquer un agent de base sur un substrat et une étape consistant à appliquer une composition à auto-assemblage pour la formation de motif sur une surface de substrat sur laquelle l'agent de base a été appliqué, formant ainsi un film auto-assemblé au moyen d'une séparation de phase à auto-assemblage, et la composition à auto-assemblage pour formation de motif contenant un copolymère séquencé qui comprend une fraction polymère a qui présente au moins l'une des structures représentées par la formule (103) ou la formule (104) et une fraction polymère b qui a une structure représentée par la formule (105), tout en ayant une teneur en fraction de sucre de 3 % en masse à 80 % en masse (inclus). Un agent de base qui contient un polymère comprenant au moins une unité choisie parmi des unités éventuellement substituées dérivées de (méth)acrylates et des unités éventuellement substituées dérivées du styrène, et qui est utilisé dans le but de provoquer une séparation de phase d'une composition à auto-assemblage pour la formation de motif contenant un copolymère séquencé qui comprend une fraction polymère a qui présente au moins l'une des structures représentées par la formule (103) ou la formule (104) et une fraction polymère b qui a une structure représentée par la formule (105), tout en ayant une teneur en fraction de sucre de 3 % en masse à 80 % en masse (inclus). Un stratifié qui comprend séquentiellement, dans l'ordre suivant, un substrat, une couche de base qui contient un polymère comprenant au moins une unité choisie parmi des unités éventuellement substituées dérivées de (méth)acrylates et des unités éventuellement substituées dérivées du styrène, et une couche de formation de motif qui contient un copolymère séquencé qui comprend une fraction polymère a qui a au moins l'une des structures représentées par la formule (103) ou la formule (104) et une fraction polymère b qui a une structure représentée par la formule (105), tout en ayant une teneur en fraction de sucre de 3 % en masse à 80 % en masse (inclus).
(JA) 基板上に下地剤を塗布する工程と、パターン形成用自己組織化組成物を基板上の下地剤を塗工した面に塗布し自己組織化相分離によって自己組織化膜を形成する工程と、を含むパターン形成方法であって、パターン形成用自己組織化組成物は、式(103)及び式(104)で表される構造の少なくとも一方を有する重合部aと、式(105)で表される構造を有する重合部bと、を含み、糖部の含有率が3質量%以上80質量%以下であるブロックコポリマーを含む、パターン形成方法。 式(103)及び式(104)で表される構造の少なくとも一方を有する重合部aと、式(105)で表される構造を有する重合部bと、を含み、糖部の含有率が3質量%以上80質量%以下であるブロックコポリマーを含むパターン形成用自己組織化組成物を相分離させるために用いられる、置換基を有してもよい(メタ)アクリレート由来単位及び置換基を有してもよいスチレン由来単位から選択される少なくとも1種を含有するポリマーを含む下地剤。 基板と、置換基を有してもよい(メタ)アクリレート由来単位及び置換基を有してもよいスチレン由来単位から選択される少なくとも1種を含有するポリマーを含む下地層と、式(103)及び式(104)で表される構造の少なくとも一方を有する重合部aと、式(105)で表される構造を有する重合部bと、を含み、糖部の含有率が3質量%以上80質量%以下であるブロックポリマーを含むパターン形成層と、をこの順で有する積層体
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)