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1. (WO2018078874) RESIN COMPOSITION FOR INTERLAYER IN LAMINATE GLASS, FILM MATERIAL FOR INTERLAYER, AND LAMINATE GLASS MANUFACTURING METHOD
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Pub. No.: WO/2018/078874 International Application No.: PCT/JP2016/082328
Publication Date: 03.05.2018 International Filing Date: 31.10.2016
IPC:
C03C 27/12 (2006.01)
[IPC code unknown for C03C 27/12]
Applicants:
日立化成株式会社 HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 東京都千代田区丸の内一丁目9番2号 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606, JP
Inventors:
向垣内 康平 MUKAIGAITO Kouhei; JP
高橋 宏明 TAKAHASHI Hiroaki; JP
古園 圭俊 FURUZONO Kazutoshi; JP
石川 栄作 ISHIKAWA Eisaku; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
清水 義憲 SHIMIZU Yoshinori; JP
平野 裕之 HIRANO Hiroyuki; JP
Priority Data:
Title (EN) RESIN COMPOSITION FOR INTERLAYER IN LAMINATE GLASS, FILM MATERIAL FOR INTERLAYER, AND LAMINATE GLASS MANUFACTURING METHOD
(FR) COMPOSITION DE RÉSINE POUR COUCHE INTERMÉDIAIRE DANS DU VERRE FEUILLETÉ, MATÉRIAU DE FILM POUR COUCHE INTERMÉDIAIRE ET PROCÉDÉ DE FABRICATION DE VERRE FEUILLETÉ
(JA) 合わせガラスの中間膜用樹脂組成物、中間膜用フィルム材及び合わせガラスの製造方法
Abstract:
(EN) The present invention relates to a resin composition for an interlayer in laminate glass, containing a copolymer of a monomer mixture that includes a (meth)acryloyl compound and a silicon compound having an ethylenically unsaturated group.
(FR) L'invention concerne une composition de résine pour une couche intermédiaire dans du verre feuilleté, contenant un copolymère d'un mélange de monomères qui comprend un composé de (méth)acryloyle et un composé de silicium pourvu d'un groupe à insaturation éthylénique.
(JA) 本発明は、(メタ)アクリロイル化合物と、エチレン性不飽和基を有するケイ素化合物と、を含有するモノマー混合物の共重合体を含む、合わせガラスの中間膜用の樹脂組成物に関する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)