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1. (WO2018077787) METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN

Pub. No.:    WO/2018/077787    International Application No.:    PCT/EP2017/076972
Publication Date: Fri May 04 01:59:59 CEST 2018 International Filing Date: Tue Oct 24 01:59:59 CEST 2017
IPC: G03F 1/70
G06F 17/50
G03F 7/20
G03F 1/00
G03F 1/36
Applicants: ASML NETHERLANDS B.V.
Inventors: HSU, Duan-Fu, Stephen
LI, Xiaoyang
Title: METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN
Abstract:
A method for optimizing a patterning device pattern, the method including: obtaining an initial design pattern having a plurality of polygons; causing at least some of the polygons to be effectively connected with each other; placing evaluation features outside the boundaries of the polygons; and creating a patterning device pattern spanning across the connected polygons based on the evaluation features.