Search International and National Patent Collections

1. (WO2018077594) METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMPONENTS

Pub. No.:    WO/2018/077594    International Application No.:    PCT/EP2017/075490
Publication Date: Fri May 04 01:59:59 CEST 2018 International Filing Date: Sat Oct 07 01:59:59 CEST 2017
IPC: G03F 7/20
Applicants: CARL ZEISS SMT GMBH
PATRA, Michael
Inventors: PATRA, Michael
Title: METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMPONENTS
Abstract:
The present invention relates to a method for the microlithographic production of microstructured components. A method according to the invention has the following steps: providing a wafer, to at least some of which a photoresist is applied; providing a mask which has the structures to be reproduced; providing a projection exposure system which has a lighting device and a projection lens; exposing the photoresist by projecting at least some of the mask onto a region of the photoresist using the projection exposure system; establishing a deviation at least of one structural property of the structures produced on the exposed wafer from a predefined target structural property, this establishing step taking place by determining at least one property of a light field used to expose the photoresist applied to the wafer; post-treating the wafer on the basis of the established deviation; and chemically developing the post-treated wafer.