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1. (WO2018077587) LITHOGRAPHIC APPARATUS AND METHOD

Pub. No.:    WO/2018/077587    International Application No.:    PCT/EP2017/075382
Publication Date: Fri May 04 01:59:59 CEST 2018 International Filing Date: Fri Oct 06 01:59:59 CEST 2017
IPC: G03F 7/20
G03F 9/00
Applicants: ASML NETHERLANDS B.V.
Inventors: BASELMANS, Johannes, Jacobus, Matheus
Title: LITHOGRAPHIC APPARATUS AND METHOD
Abstract:
A scanning exposure of a plurality of target regions on a substrate is performed such that an image of each of a plurality of markers is formed on each of the plurality of target regions. Each of the plurality of markers is of a form such that a property of the image of the marker is dependent on the contrast in a known manner. During the scanning exposure the substrate is moved in a scanning direction and at least one of: a difference between a rotation angle of the substrate and a rotation angle of a plane of best focus, about a first axis perpendicular to the scanning direction, a difference between a rotation angle of the substrate and a rotation angle of the plane of best focus about a second axis perpendicular to the first axis and perpendicular to the scanning direction, and a speed of the substrate in the scanning direction relative to the plane of best focus, is selected to be different for the scanning exposures of at least two of the plurality of target regions. Next the property of the image of each of the plurality of markers is determined.