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1. (WO2018077239) DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE
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Pub. No.: WO/2018/077239 International Application No.: PCT/CN2017/108059
Publication Date: 03.05.2018 International Filing Date: 27.10.2017
IPC:
H01L 21/77 (2017.01) ,H01L 27/12 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12
the substrate being other than a semiconductor body, e.g. an insulating body
Applicants: BOE TECHNOLOGY GROUP CO., LTD.[CN/CN]; No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
Inventors: SUN, Shuang; CN
PENG, Kuanjun; CN
Agent: CHINA PATENT AGENT (H.K.) LTD.; 22/F, Great Eagle Centre 23 Harbour Road, Wanchai Hong Kong, CN
Priority Data:
201610930682.531.10.2016CN
Title (EN) DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE
(FR) SUBSTRAT D'AFFICHAGE ET SON PROCÉDÉ DE FABRICATION, ET DISPOSITIF D'AFFICHAGE
(ZH) 显示基板及其制造方法、显示装置
Abstract:
(EN) A display substrate and a method for manufacturing same, and a display device. The method for manufacturing a display substrate comprises: providing a base (1); and forming a first thin film transistor comprising a first active layer (3) and a second thin film transistor comprising a second active layer (6) on the base (1). The second active layer (6) comprises a central region (61) and doped regions at two sides of the central region (61) respectively. Forming a first thin film transistor comprising a first active layer (3) and a second thin film transistor comprising a second active layer (6) on the base (1) comprises: forming doped regions of the first active layer (3) and the second active layer (6) by means of a patterning process.
(FR) La présente invention concerne un substrat d'affichage et son procédé de fabrication, et un dispositif d'affichage. Le procédé de fabrication d'un substrat d'affichage consiste à : utiliser une base (1) ; et former un premier transistor à couches minces comprenant une première couche active (3) et un second transistor à couches minces comprenant une seconde couche active (6) sur la base (1). La seconde couche active (6) comprend une région centrale (61) et des régions dopées sur deux côtés de la région centrale (61) respectivement. La formation d'un premier transistor à couches minces comprenant une première couche active (3) et d'un second transistor à couches minces comprenant une seconde couche active (6) sur la base (1) consiste à : former des régions dopées de la première couche active (3) et de la seconde couche active (6) au moyen d'un procédé de formation de motifs.
(ZH) 一种显示基板及其制造方法,以及显示装置。显示基板的制造方法包括:提供衬底(1);以及,在衬底(1)上形成包括第一有源层(3)的第一薄膜晶体管和包括第二有源层(6)的第二薄膜晶体管。第二有源层(6)包括中心区域(61)和分别位于中心区域(61)两侧的掺杂区域。在衬底上形成包括第一有源层(3)的第一薄膜晶体管和包括第二有源层(6)的第二薄膜晶体管包括:通过一次构图工艺形成第一有源层(3)和第二有源层(6)的掺杂区域。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)