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1. (WO2018077090) MAGNETIC THIN FILM DEPOSITION CHAMBER AND THIN FILM DEPOSITION DEVICE
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Pub. No.: WO/2018/077090 International Application No.: PCT/CN2017/106688
Publication Date: 03.05.2018 International Filing Date: 18.10.2017
IPC:
H01F 41/14 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
F
MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
41
Apparatus or processes specially adapted for manufacturing or assembling the devices covered by this subclass
14
for applying magnetic films to substrates
Applicants: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.[CN/CN]; No. 8 Wenchang Avenue Beijing Economic-Technological Development Area, Beijing 100176, CN
Inventors: YANG, Yujie; CN
ZHANG, Tongwen; CN
XIA, Wei; CN
DING, Peijun; CN
WANG, Hougong; CN
Agent: TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS; Tianshu ZHANG 10th Floor, Tower D, Minsheng Financial Center, 28 Jianguomennei Avenue, Dongcheng District Beijing 100005, CN
Priority Data:
201610929208.031.10.2016CN
Title (EN) MAGNETIC THIN FILM DEPOSITION CHAMBER AND THIN FILM DEPOSITION DEVICE
(FR) CHAMBRE DE DÉPÔT DE FILM MAGNÉTIQUE MINCE ET DISPOSITIF DE DÉPÔT DE FILM MINCE
(ZH) 磁性薄膜沉积腔室及薄膜沉积设备
Abstract:
(EN) A magnetic thin film deposition chamber and a thin film deposition device, comprising a chamber main body (1) and a bias magnetic field apparatus, the inside of the chamber main body (1) being provided with a base (2), used for bearing a workpiece to be processed (7). The bias magnetic field apparatus is used for forming a horizontal magnetic field above the base (2), the horizontal magnetic field being used for enabling a magnetic film layer deposited on the workpiece to be processed (7) to have in-plane anisotropy. The thin film deposition chamber forms the horizontal magnetic field, which is capable of inducing magnetic thin film in-plane anisotropy, above the base (2).
(FR) La présente invention concerne une chambre de dépôt de film magnétique mince et un dispositif de dépôt de film mince, comprenant un corps principal de chambre (1) et un appareil de champ magnétique de polarisation, l'intérieur du corps principal de chambre (1) étant pourvu d'une base (2), destinée à soutenir une pièce à traiter (7). L'appareil de champ magnétique de polarisation est destiné à former un champ magnétique horizontal au-dessus de la base (2), le champ magnétique horizontal étant destiné à permettre à une couche de film magnétique déposée sur la pièce à usiner devant être traitée (7) d'avoir une anisotropie dans le plan. La chambre de dépôt de film mince forme le champ magnétique horizontal, qui permet d'induire une anisotropie magnétique dans le plan de film magnétique mince, au-dessus de la base (2).
(ZH) 一种磁性薄膜沉积腔室及薄膜沉积设备,包括腔室主体(1)和偏置磁场装置,在腔室主体内(1)设置有基座(2),用以承载待加工工件(7)。偏置磁场装置用于在基座(2)上方形成水平磁场,该水平磁场用于使沉积在待加工工件(7)上的磁性膜层具有面内各向异性。该薄膜沉积腔室能够在基座(2)上方形成足以诱发磁性薄膜的面内各向异性的水平磁场。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)