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Pub. No.:    WO/2018/076522    International Application No.:    PCT/CN2016/112234
Publication Date: 03.05.2018 International Filing Date: 27.12.2016
H01S 3/098 (2006.01)
Applicants: SUZHOU INSTITUTE OF NANO-TECH AND NANO-BIONICS(SINANO), CHINESE ACADEMY OF SCIENCES [CN/CN]; No.398 Ruoshui Road, SEID, Suzhou Industrial Park Suzhou, Jiangsu 215123 (CN)
Inventors: ZHANG, Ziyang; (CN).
LIU, Qinglu; (CN)
Agent: MING & YUE INTELLECTUAL PROPERTY LAW FIRM; Suite 611, 6/F, Block 206, Nanyou Second Industrial Zone(Block B,HengYue Center), No.21 Dengliang Road, Nanshan Shenzhen, Guangdong 518054 (CN)
Priority Data:
201610931340.5 31.10.2016 CN
(ZH) 一种复合结构的可饱和吸收镜
Abstract: front page image
(EN)Disclosed is a saturable absorption mirror of a composite structure, comprising: a substrate (10), a buffer layer (20) on the substrate, a distributed Bragg mirror (30) on the buffer layer, a quantum dot saturable absorber (40) or a quantum well saturable absorber (70) located on the distributed Bragg mirror, and a graphene saturable absorber (50) located on the quantum dot or quantum well saturable absorber. The graphene saturable absorber and the quantum dot saturable absorber are combined, or the graphene saturable absorber and the quantum well saturable absorber are combined to act as a saturable absorber in the saturable absorption mirror to improve the thermal damage threshold and the stability of the optical properties of the saturable absorber, and to achieve the ultra-fast laser pulses having a high-power and short-pulse locked mode, a stable output repetition cycle, a narrow pulse width, and a short response time.
(FR)L'invention concerne un miroir d'absorption saturable d'une structure composite, comprenant : un substrat (10), une couche tampon (20) sur le substrat, un miroir de Bragg distribué (30) sur la couche tampon, un absorbeur saturable à points quantiques (40) ou un absorbeur saturable à puits quantique (70) situé sur le miroir de Bragg distribué, et un absorbeur saturable au graphène (50) situé sur le point quantique ou l'absorbeur saturable à puits quantique. L'absorbeur saturable au graphène et l'absorbeur saturable à points quantiques sont combinés, ou l'absorbeur saturable au graphène et l'absorbeur saturable à puits quantique sont combinés pour agir en tant que absorbeur saturable dans le miroir à absorption saturable pour améliorer le seuil de détérioration thermique et la stabilité des propriétés optiques de l'absorbeur saturable, et pour obtenir les impulsions laser ultra-rapides ayant un mode verrouillé à haute puissance et à impulsions courtes, un cycle de répétition de sortie stable, une largeur d'impulsion étroite et un temps de réponse court.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)