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1. (WO2018066547) OXIDE SINTERED BODY AND SPUTTERING TARGET
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/066547 International Application No.: PCT/JP2017/035939
Publication Date: 12.04.2018 International Filing Date: 03.10.2017
IPC:
C04B 35/01 (2006.01) ,C23C 14/08 (2006.01) ,C23C 14/34 (2006.01) ,H01L 29/786 (2006.01)
Applicants: IDEMITSU KOSAN CO.,LTD.[JP/JP]; 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP
Inventors: INOUE, Kazuyoshi; JP
SHIBATA, Masatoshi; JP
TOMAI, Shigekazu; JP
Agent: HEIWA INTERNATIONAL PATENT OFFICE; Shibashin Kanda Bldg. 3rd Floor, 26, Kanda Suda-cho 1-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2016-19614304.10.2016JP
Title (EN) OXIDE SINTERED BODY AND SPUTTERING TARGET
(FR) CORPS FRITTÉ À BASE D'OXYDE ET CIBLE DE PULVÉRISATION
(JA) 酸化物焼結体及びスパッタリングターゲット
Abstract: front page image
(EN) An oxide sintered body which contains a perovskite phase and a bixbyite phase represented by In2O3.
(FR) L'invention concerne un corps fritté à base d'oxyde qui contient une phase pérovskite et une phase bixbyite représentée par In2O3
(JA) ペロブスカイト相及びInで表されるビックスバイト相を含む酸化物焼結体。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)