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1. (WO2018066398) NICKEL PLATING SOLUTION AND NICKEL PLATING SOLUTION PRODUCTION METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/066398 International Application No.: PCT/JP2017/034509
Publication Date: 12.04.2018 International Filing Date: 25.09.2017
IPC:
C25D 3/18 (2006.01)
Applicants: C. UYEMURA & CO., LTD.[JP/JP]; 2-6, Dosho-machi 3-chome, Chuo-ku, Osaka-shi, Osaka 5410045, JP
Inventors: KISO, Masayuki; JP
SUGIURA, Hironori; JP
MAEDA, Ryo; JP
Agent: KOIKE, Akira; JP
KONO, Takaaki; JP
KOJIYAMA, Koichi; JP
MURAKAMI, Hiroyuki; JP
Priority Data:
2016-19896307.10.2016JP
Title (EN) NICKEL PLATING SOLUTION AND NICKEL PLATING SOLUTION PRODUCTION METHOD
(FR) SOLUTION DE NICKELAGE ET PROCÉDÉ DE PRODUCTION DE SOLUTION DE NICKELAGE
(JA) ニッケルめっき液及びニッケルめっき液の製造方法
Abstract: front page image
(EN) The purpose of the present invention is to provide a satin nickel plating solution that enables satin nickel plating without resulting in poor appearance and does not require an activated carbon treatment for a long time. This nickel-plating solution is to be used for satin nickel-plating and characterized by containing at least a saccharinate, a primary amine compound and a cationic surfactant.
(FR) La présente invention a pour objet de fournir une solution de nickelage satiné qui permet un nickelage satiné sans entraîner un mauvais aspect et ne nécessite pas de traitement au carbone activé pendant une longue période. Cette solution de nickelage est destinée à être utilisée pour le nickelage satiné et est caractérisée en ce qu'elle contient au moins un saccharinate, un composé amine primaire et un tensioactif cationique.
(JA) サテンニッケルめっきの外観不良を引き起こすことなく、長期間活性炭処理を必要としない、サテンニッケルめっき液を提供することを目的とする。 サテンニッケルめっきに用いられるニッケルめっき液であって、少なくともサッカリン酸塩と、1級アミン化合物と、カチオン界面活性剤とを含有することを特徴とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)