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1. (WO2018064292) METHODS OF FORMING SELF-ALIGNED VIAS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/064292    International Application No.:    PCT/US2017/053936
Publication Date: 05.04.2018 International Filing Date: 28.09.2017
IPC:
H01L 21/768 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054 (US)
Inventors: THOMPSON, David; (US).
SCHMIEGE, Benjamin; (US).
ANTHIS, Jeffrey W.; (US).
MALLICK, Abhijit Basu; (US).
ROY, Susmit Singha; (US).
DUAN, Ziqing; (US)
Agent: BLANKMAN, Jeffrey I.; (US)
Priority Data:
62/403,036 30.09.2016 US
15/718,148 28.09.2017 US
Title (EN) METHODS OF FORMING SELF-ALIGNED VIAS
(FR) PROCÉDÉS DE FORMATION DE TROUS D'INTERCONNEXION AUTO-ALIGNÉS
Abstract: front page image
(EN)Processing methods comprising selectively orthogonally growing a first material through a mask to provide an expanded first material are described. The mask can be removed leaving the expanded first material extending orthogonally from the surface of the first material. Further processing can create a self-aligned via.
(FR)L'invention concerne des procédés de traitement comprenant la croissance orthogonale sélective d'un premier matériau à travers un masque pour fournir un premier matériau expansé. Le masque peut être retiré, laissant le premier matériau expansé s'étendant orthogonalement à partir de la surface du premier matériau. Un autre traitement peut créer un trou d'interconnexion auto-aligné.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)