Search International and National Patent Collections


Pub. No.:    WO/2018/063784    International Application No.:    PCT/US2017/050937
Publication Date: Fri Apr 06 01:59:59 CEST 2018 International Filing Date: Tue Sep 12 01:59:59 CEST 2017
IPC: G03F 7/00
H01L 23/00
H01L 21/033
Applicants: ILLUMINA, INC.
Inventors: HAN, Hui
YUAN, Dajun A.
BOWEN, M. Shane
Imprinted substrates are often used to produce miniaturized devices for use in electrical, optic and biochemical applications. Imprinting techniques, such as nanoimprinting lithography, may leave residues in the surface of substrates that affect bonding and decrease the quality of the produced devices. An imprinted substrate with residue-free region, or regions with a reduced amount of residue for improved bonding quality is introduced. Methods to produce imprinted substrates without residues from the imprinting process are also introduced. Methods include physical exclusion methods, selective etching methods and energy application methods. These methods may produce residue-free regions in the surface of the substrate that can be used to produce higher strength bonding.