Search International and National Patent Collections

1. (WO2018063471) OPTICAL NEAR-FIELD METROLOGY

Pub. No.:    WO/2018/063471    International Application No.:    PCT/US2017/041404
Publication Date: Fri Apr 06 01:59:59 CEST 2018 International Filing Date: Tue Jul 11 01:59:59 CEST 2017
IPC: G01B 11/02
G01B 9/02
Applicants: KLA-TENCOR CORPORATION
Inventors: PASKOVER, Yuri
MANASSEN, Amnon
LEVINSKI, Vladimir
Title: OPTICAL NEAR-FIELD METROLOGY
Abstract:
Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.