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1. (WO2018063318) PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING

Pub. No.:    WO/2018/063318    International Application No.:    PCT/US2016/054742
Publication Date: Fri Apr 06 01:59:59 CEST 2018 International Filing Date: Sat Oct 01 01:59:59 CEST 2016
IPC: H01L 21/768
Applicants: INTEL CORPORATION
Inventors: BRISTOL, Robert L.
LIN, Kevin L.
BLACKWELL, James M.
HOURANI, Rami
HAN, Eungnak
Title: PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING
Abstract:
Approaches based on photobucket floor colors with selective grafting for semiconductor structure fabrication, and the resulting structures, are described. For example, a grating structure is formed above an ILD layer formed above a substrate, the grating structure including a plurality of dielectric spacers separated by alternating first trenches and second trenches, grafting a resist-inhibitor layer in the first trenches but not in the second trenches, forming photoresist in the first trenches and in the second trenches, exposing and removing the photoresist in select ones of the second trenches to a lithographic exposure to define a set of via locations, etching the set of via locations into the ILD layer, and forming a plurality of metal lines in the ILD layer, where select ones of the plurality of metal lines includes an underlying conductive via corresponding to the set of via locations.