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1. (WO2018062697) COMPOSITION FOR HAIR CARE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/062697    International Application No.:    PCT/KR2017/009347
Publication Date: 05.04.2018 International Filing Date: 28.08.2017
IPC:
A61K 8/362 (2006.01), A61K 8/41 (2006.01), A61K 8/44 (2006.01), A61Q 5/00 (2006.01)
Applicants: AMOREPACIFIC CORPORATION [KR/KR]; 100, Hangang-daero Yongsan-gu Seoul 04386 (KR)
Inventors: AHN, Da Woon; (KR).
BIN, Sung Ah; (KR).
IN, Byeong Gyu; (KR).
CHOI, Jang Won; (KR)
Agent: KIM, Sung Ho; (KR).
PARK, Hyung-Dal; (KR).
KIM, Byeong Pil; (KR)
Priority Data:
10-2016-0124305 27.09.2016 KR
10-2017-0100148 08.08.2017 KR
Title (EN) COMPOSITION FOR HAIR CARE
(FR) COMPOSITION DE SOINS CAPILLAIRES
(KO) 모발 관리용 조성물
Abstract: front page image
(EN)The present invention relates to a composition for hair care and, more specifically, comprises a C2 to C4 aliphatic dibasic acid compound and a C2 to C6 aliphatic diamine compound. The composition for hair care according to the present invention can not only recover damaged hair from the inside of the hair, but also strengthen hair semipermanently, and therefore can be applied widely as a product of various formulations.
(FR)La présente invention concerne une composition de soins capillaires et, plus précisément, une composition comprenant un composé d'un acide dibasique aliphatique en C2 à C4 et un composé de diamine aliphatique en C2 à C6. Cette composition de soins capillaires peut non seulement restaurer des cheveux endommagés à partir de l'intérieur des cheveux, mais également renforcer les cheveux de façon semi-permanente, et peut donc être appliquée largement en tant que produit sous des formes diverses.
(KO)본 발명은 모발 관리용 조성물에 관한 것으로, 보다 상세하게는 C2 내지 C4의 지방족 이염기산 화합물 및 C2 내지 C6의 지방족 디아민 화합물을 포함한다. 본 발명에 따른 모발 관리용 조성물은 모발 내부부터 손상된 모발을 회복시킬 뿐 아니라 반영구적인 모발 강화 효과를 나타내기 때문에 다양한 제형의 제품으로 폭넓은 적용이 가능하다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)