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1. (WO2018062425) ACID DIANHYDRIDE AND USE THEREOF
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Pub. No.: WO/2018/062425 International Application No.: PCT/JP2017/035325
Publication Date: 05.04.2018 International Filing Date: 28.09.2017
IPC:
C08G 73/10 (2006.01) ,C07C 69/773 (2006.01) ,C07D 307/89 (2006.01) ,C08J 5/18 (2006.01) ,H01L 21/336 (2006.01) ,H01L 29/786 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/02 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
73
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups C08G12/-C08G71/238
06
Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
10
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
69
Esters of carboxylic acids; Esters of carbonic or haloformic acids
76
Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a six-membered aromatic ring
773
esterified with a hydroxy compound having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
307
Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
77
ortho- or peri-condensed with carbocyclic rings or ring systems
87
Benzo [c] furans; Hydrogenated benzo [c] furans
89
with two oxygen atoms directly attached in positions 1 and 3
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5
Manufacture of articles or shaped materials containing macromolecular substances
18
Manufacture of films or sheets
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
334
Multistep processes for the manufacture of devices of the unipolar type
335
Field-effect transistors
336
with an insulated gate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29
Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof
66
Types of semiconductor device
68
controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified, or switched
76
Unipolar devices
772
Field-effect transistors
78
with field effect produced by an insulated gate
786
Thin-film transistors
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
葉 鎮嘉 Ye, ChenJia; TW
何 邦慶 Ho, BangChing; TW
近藤 光正 KONDO, Mitsumasa; JP
Agent:
特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE; 東京都千代田区神田駿河台3丁目2番地 新御茶ノ水アーバントリニティ Shin-Ochanomizu Urban Trinity, 2, Kandasurugadai 3-chome, Chiyoda-ku, Tokyo 1010062, JP
Priority Data:
2016-19008928.09.2016JP
Title (EN) ACID DIANHYDRIDE AND USE THEREOF
(FR) DIANHYDRIDE D'ACIDE ET UTILISATION ASSOCIÉE
(JA) 酸二無水物およびその利用
Abstract:
(EN) [Problem] To provide a polyamic acid that yields a polyimide film characterized by having low retardation as well as exceptional flexibility and transparency, and a novel acid dianhydride to be used in the production of said polyamic acid. [Solution] A polyamic acid obtained by reacting an acid dianhydride component and a diamine component, wherein the polyamic acid is characterized in that the acid dianhydride component includes an acid dianhydride represented by formula (1-1); a composition for forming a polyimide film including said polyamic acid; and a polyimide film obtained therefrom. (In the formula, R1 to R5 each independently represent a halogen atom, an alkyl group, or an alkoxy group; R6 and R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group; a and b each independently represent an integer of 0-4; c and d each independently represent an integer of 0-3; and e represents an integer of 0-2.)
(FR) La présente invention vise à fournir un acide polyamique qui produit un film de polyimide caractérisé en ce qu'il présente un faible retard ainsi qu'une flexibilité et une transparence exceptionnelles, et un nouveau dianhydride d'acide à utiliser dans la production dudit acide polyamique. L'invention concerne par conséquent un acide polyamique obtenu par mise en réaction d'un composant dianhydride d'acide et d'un composant diamine, l'acide polyamique étant caractérisé en ce que le composant dianhydride d'acide comprend un dianhydride d'acide représenté par la formule (1-1); une composition pour former un film de polyimide comprenant ledit acide polyamique; et un film de polyimide obtenu à partir de celle-ci. (Dans la formule, R1 à R5 représentent chacun indépendamment un atome d'halogène, un groupe alkyle, ou un groupe alcoxy; R6 et R7 représentent chacun indépendamment un atome d'hydrogène, un atome d'halogène, un groupe alkyle, ou un groupe alcoxy; a et b représentent chacun indépendamment un nombre entier de 0 à 4; c et d représentent chacun indépendamment un nombre entier de 0 à 3; et e représente un nombre entier de 0 à 2.)
(JA) 【課題】耐熱性、柔軟性及び透明性に優れるだけでなく、リタデーションが低いという特徴をも有するポリイミド膜を与えるポリアミック酸並びに該ポリアミック酸の製造に用いる新規な酸二無水物を提供すること。 【解決手段】酸二無水物成分と、ジアミン成分とを反応させて得られるポリアミック酸であって、前記酸二無水物成分が下記式(1-1)で表される酸二無水物を含むことを特徴とするポリアミック酸並びに該ポリアミック酸を含むポリイミド膜形成用組成物及びそれから得られるポリイミド膜。(式中、R乃至Rは、互いに独立して、ハロゲン原子、アルキル基またはアルコキシ基を表し、R及びRは、互いに独立して、水素原子、ハロゲン原子、アルキル基又はアルコキシ基を表し、aおよびbは、互いに独立して、0~4の整数を表し、cおよびdは、互いに独立して、0~3の整数を表し、eは、0~2の整数を表す。)
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African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)