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1. (WO2018062403) POLISHING LIQUID COMPOSITION

Pub. No.:    WO/2018/062403    International Application No.:    PCT/JP2017/035262
Publication Date: Fri Apr 06 01:59:59 CEST 2018 International Filing Date: Fri Sep 29 01:59:59 CEST 2017
IPC: H01L 21/304
B24B 37/00
C09K 3/14
Applicants: KAO CORPORATION
花王株式会社
Inventors: DOI Haruhiko
土居陽彦
Title: POLISHING LIQUID COMPOSITION
Abstract:
A polishing liquid composition is provided which can improve polishing selectivity and suppress uneven polishing while securing high polishing speeds. This invention relates to a polishing liquid composition which contains cerium oxide particles A, oligosaccharides B with a weight average molecular weight of 800-2800, and water.