Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018062325) COPOLYESTER RESIN
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/062325 International Application No.: PCT/JP2017/035072
Publication Date: 05.04.2018 International Filing Date: 27.09.2017
IPC:
C08G 63/60 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
63
Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
02
Polyesters derived from hydroxy carboxylic acids or from polycarboxylic acids and polyhydroxy compounds
60
derived from the reaction of a mixture of hydroxy carboxylic acids, polycarboxylic acids and polyhydroxy compounds
Applicants:
三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP/JP]; 東京都千代田区丸の内二丁目5番2号 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324, JP
Inventors:
本多 栄一 HONDA, Eiichi; JP
吉村 康明 YOSHIMURA, Yasuaki; JP
野口 敬太 NOGUCHI, Keita; JP
佐竹 雄一郎 SATAKE, Yuichiro; JP
元井 隆司 MOTOI, Takashi; JP
Agent:
稲葉 良幸 INABA, Yoshiyuki; JP
大貫 敏史 ONUKI, Toshifumi; JP
内藤 和彦 NAITO, Kazuhiko; JP
Priority Data:
2016-19034428.09.2016JP
Title (EN) COPOLYESTER RESIN
(FR) RÉSINE DE COPOLYESTER
(JA) 共重合ポリエステル樹脂
Abstract:
(EN) A copolyester resin having units (A) represented by general formula (1), diol units (B), and derivative units (C) that form a dicarboxylic acid or an ester thereof, wherein the copolyester resin has 10-95 mol% of units (A) among the total units of the copolyester resin and satisfies (1)-(3) below. (1) The glass transition temperature of the copolyester resin is 90°C or higher. (2) The crystallization calorific value on cooling of the copolyester resin is 5 J/g or lower. (3) The absolute value of the photoelastic coefficient of the copolyester resin is 40 × 10-12 Pa-1 or lower. (In general formula (1), R1 is a hydrogen atom, CH3, or C2H5, R2 and R3 each independently are a hydrogen atom or CH3, and n is 0 or 1.)
(FR) L'invention concerne une résine de copolyester présentant des motifs (A) représentés par la formule générale (1), des motifs diol (B) et des motifs dérivés (C) qui forment un acide dicarboxylique ou un ester correspondant, la résine de copolyester comprenant 10-95 % en mole de motifs (A) parmi la totalité de motifs de la résine de copolyester et satisfaisant aux conditions (1)-(3) ci-dessous. (1) La température de transition vitreuse de la résine de copolyester est de 90°C ou plus. (2) La valeur calorifique de cristallisation lors du refroidissement de la résine de copolyester est de 5 J/g ou moins. (3) La valeur absolue du coefficient photoélastique de la résine de copolyester est de 40 × 10-12 Pa-1 ou moins. (Dans la formule générale (1), R1 représente un atome d'hydrogène, CH3 ou C2H5, R2 et R3 représentent chacun indépendamment un atome d'hydrogène ou CH3 et n vaut 0 ou 1).
(JA) 下記一般式(1)で表される単位(A)、ジオール単位(B)、及びジカルボン酸又はそのエステル形成性誘導体単位(C)を有する共重合ポリエステル樹脂であって、 前記共重合ポリエステル樹脂が有する全単位中、前記単位(A)が10~95mol%であり、 下記(1)~(3)を満たす、共重合ポリエステル樹脂。 (1)前記共重合ポリエステル樹脂のガラス転移温度が90℃以上である。 (2)前記共重合ポリエステル樹脂の降温時結晶化発熱量が5J/g以下である。 (3)前記共重合ポリエステル樹脂の光弾性係数の絶対値が40×10-12Pa-1以下である。 (前記一般式(1)において、Rは水素原子、CH又はCであり、R及びRは、それぞれ独立に水素原子又はCHであり、nは0又は1である。)
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)