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1. (WO2018061781) DRY ETCHING COMPOSITION, KIT, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL FILTER
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Pub. No.: WO/2018/061781 International Application No.: PCT/JP2017/033111
Publication Date: 05.04.2018 International Filing Date: 13.09.2017
IPC:
G02B 5/22 (2006.01) ,G03F 7/004 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
22
Absorbing filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants: FUJIFILM CORPORATION[JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors: ARIMURA Keisuke; JP
Agent: NAKASHIMA Junko; JP
YONEKURA Junzo; JP
MURAKAMI Yasunori; JP
Priority Data:
2016-18826527.09.2016JP
Title (EN) DRY ETCHING COMPOSITION, KIT, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING OPTICAL FILTER
(FR) COMPOSITION POUR GRAVURE SÈCHE, KIT, PROCÉDÉ DE FORMATION DE MOTIF, ET PROCÉDÉ DE FABRICATION DE FILTRE OPTIQUE
(JA) ドライエッチング用組成物、キット、パターン形成方法および光学フィルタの製造方法
Abstract:
(EN) Provided are a dry etching composition having high opacity to visible light and whereby a cured film pattern having excellent transmission of infrared rays in a specific wavelength region can be formed with good resolution, a kit, a pattern formation method, and a method for manufacturing an optical filter. The dry etching composition includes a coloring material for transmitting infrared rays and blocking visible light, a curable compound, and a solvent, the ratio A/B of the minimum value A of the light absorbance of the composition in a wavelength range of 400-700 nm and the maximum value B of the light absorbance in a wavelength range of 1100-1300 nm being 4.5 or greater.
(FR) L’invention fournit une composition pour gravure sèche présentant une opacité élevée à la lumière visible, et permettant de former selon une résolution satisfaisante un motif de film durci d’une excellente perméabilité aux rayons infrarouges d’une région de longueur d’ondes spécifique. L’invention fournit également un kit, un procédé de formation de motif et un procédé de fabrication de filtre optique. La composition pour gravure sèche contient un matériau colorant laissant passer les rayons infrarouges et bloquant la lumière visible, un composé durcissable, et un solvant. A/B, le rapport entre la valeur minimale (A) d’absorbance de la composition dans une plage de longueur d’ondes de 400 à 700nm, et la valeur maximale (B) de son absorbance dans une plage de longueur d’ondes de 1100 à 1300nm, est supérieur ou égal à 4,5.
(JA) 可視光の遮光性が高く、かつ、特定の波長領域の赤外線の透過性に優れた硬化膜のパターンを解像性良く形成できるドライエッチング用組成物、キット、パターン形成方法および光学フィルタの製造方法を提供する。ドライエッチング用組成物は、赤外線を透過させて可視光を遮光する色材と、硬化性化合物と、溶剤とを含み、組成物の波長400~700nmの範囲における吸光度の最小値Aと、波長1100~1300nmの範囲における吸光度の最大値Bとの比であるA/Bが4.5以上である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)