WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2018059836) A SUBSTRATE, A SUBSTRATE HOLDER, A SUBSTRATE COATING APPARATUS, A METHOD FOR COATING THE SUBSTRATE AND A METHOD FOR REMOVING THE COATING
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/059836    International Application No.:    PCT/EP2017/071179
Publication Date: 05.04.2018 International Filing Date: 23.08.2017
IPC:
G03F 7/16 (2006.01), B05D 1/18 (2006.01), C23C 16/455 (2006.01), H01L 21/687 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven (NL)
Inventors: ACHANTA, Satish; (NL).
WELTERS, Wilhelmus, Jacobus, Johannes; (NL).
SOETHOUDT, Abraham, Alexander; (NL).
KAMMINGA, Jelmer, Mattheüs; (NL).
LIEDECKE, Christian; (NL)
Agent: PETERS, John; (NL)
Priority Data:
16190865.2 27.09.2016 EP
Title (EN) A SUBSTRATE, A SUBSTRATE HOLDER, A SUBSTRATE COATING APPARATUS, A METHOD FOR COATING THE SUBSTRATE AND A METHOD FOR REMOVING THE COATING
(FR) SUBSTRAT, SUPPORT DE SUBSTRAT, APPAREIL DE REVÊTEMENT DE SUBSTRAT, PROCÉDÉ DE REVÊTEMENT DU SUBSTRAT ET PROCÉDÉ D'ÉLIMINATION DU REVÊTEMENT
Abstract: front page image
(EN)The present invention relates to a substrate (100), a substrate holder (200), a substrate coating apparatus (800, 801), a method for coating the substrate (100) and a method for removing the coating (102). A monomolecular layer (102) is applied to the backside (101) of the substrate or a clamp surface (201) of the substrate holder (200). The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force (210). After loading the substrate (100) on the substrate holder (200) full clamping force (210) is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer (102), resulting in an increase of the friction force between the substrate (100) and the substrate holder (200).
(FR)La présente invention concerne un substrat (100), un support de substrat (200), un appareil de revêtement de substrat (800, 801), un procédé de revêtement du substrat (100) et un procédé d'élimination du revêtement (102). Une couche monomoléculaire (102) est appliquée sur la face arrière (101) du substrat ou sur une surface de serrage (201) du support de substrat (200). La force de frottement entre le côté arrière du substrat et le substrat est faible lorsque le substrat ne subit pas de force de serrage complète (210). Après le chargement du substrat (100) sur le support de substrat (200), une force de serrage complète (210) est exercée afin de fixer le substrat. La force de serrage provoque un retrait local de la couche monomoléculaire (102), ce qui entraîne une augmentation de la force de frottement entre le substrat (100) et le support de substrat (200).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)