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1. (WO2018057623) ENDPOINT DETECTION WITH COMPENSATION FOR FILTERING

Pub. No.:    WO/2018/057623    International Application No.:    PCT/US2017/052514
Publication Date: Fri Mar 30 01:59:59 CEST 2018 International Filing Date: Thu Sep 21 01:59:59 CEST 2017
IPC: H01L 21/304
H01L 21/306
H01L 21/67
H01L 21/66
Applicants: APPLIED MATERIALS, INC.
Inventors: XU, Kun
LIN, Kevin
CARLSSON, Ingemar
SHEN, Shih-Haur
LIU, Tzu-Yu
Title: ENDPOINT DETECTION WITH COMPENSATION FOR FILTERING
Abstract:
A method of polishing includes polishing a layer of a substrate, monitoring the layer of the substrate with an in-situ monitoring system to generate signal that depends on a thickness of the layer, filtering the signal to generate a filtered signal, determining an adjusted threshold value from an original threshold value and a time delay value representative of time required for filtering the signal, and triggering a polishing endpoint when the filtered signal crosses the adjusted threshold value.