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|1. (WO2018057399) WAVELENGTH-BASED OPTICAL FILTERING|
|Applicants:||ASML NETHERLANDS B.V.
|Inventors:||SCHAFGANS, Alexander Anthony
FOMENKOV, Igor Vladimirovich
BROWN, Daniel John William
STINSON, Cory Alan
RAFAC, Robert Jay
|Title:||WAVELENGTH-BASED OPTICAL FILTERING|
An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify Sight having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.