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1. (WO2018057399) WAVELENGTH-BASED OPTICAL FILTERING

Pub. No.:    WO/2018/057399    International Application No.:    PCT/US2017/051666
Publication Date: Fri Mar 30 01:59:59 CEST 2018 International Filing Date: Fri Sep 15 01:59:59 CEST 2017
IPC: G01J 3/10
G02B 5/18
G02B 5/26
G03F 7/20
H05G 2/00
Applicants: ASML NETHERLANDS B.V.
Inventors: SCHAFGANS, Alexander Anthony
FOMENKOV, Igor Vladimirovich
TAO, Yezheng
ROKISTSKI, Rostislav
BROWN, Daniel John William
STINSON, Cory Alan
RAFAC, Robert Jay
Title: WAVELENGTH-BASED OPTICAL FILTERING
Abstract:
An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify Sight having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.