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1. (WO2018056276) RELEASE FILM AND METHOD FOR MANUFACTURING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/056276 International Application No.: PCT/JP2017/033795
Publication Date: 29.03.2018 International Filing Date: 20.09.2017
IPC:
B32B 27/36 (2006.01) ,B32B 27/00 (2006.01) ,B29C 55/12 (2006.01) ,B29L 7/00 (2006.01) ,B29L 9/00 (2006.01)
Applicants: UNITIKA LTD.[JP/JP]; 50, Higashi-Hommachi 1-chome, Amagasaki-shi, Hyogo 6600824, JP
Inventors: SHIMIZU Mari; JP
TANAKA Kouhei; JP
OKUMURA Nobuyasu; JP
Agent: MORIMOTO INT'L PATENT OFFICE; SHINANOBASHI MITSUI BLDG. 3rd Floor, 11-7, Utsubohonmachi 1-chome, Nishi-ku, Osaka-shi, Osaka 5500004, JP
Priority Data:
2016-18250120.09.2016JP
Title (EN) RELEASE FILM AND METHOD FOR MANUFACTURING SAME
(FR) FILM ANTIADHÉSIF ET PROCÉDÉ POUR LA FABRICATION DE CELUI-CI
(JA) 離型フィルムおよびその製造方法
Abstract:
(EN) The present invention is a release film in which a resin layer is provided to at least one surface of a substrate film, the release film characterized in that the resin layer includes 100 parts by mass of an acid-modified polyolefin resin, 1-20 parts by mass of a cross-linking agent, and 10-1000 parts by mass of a polyvinyl alcohol having a saponification ratio of 99% or less.
(FR) La présente invention concerne un film antiadhésif dans lequel une couche de résine est disposée sur au moins une surface d'un film de substrat, le film antiadhésif étant caractérisé en ce que la couche de résine comprend 100 parties en masse d'une résine de polyoléfine modifiée par un acide, 1 à 20 parties en masse d'un agent de réticulation et 10 à 1000 parties en masse d'un poly(alcool vinylique) ayant un taux de saponification inférieur ou égal à 99 %.
(JA) 基材フィルムの少なくとも片面に樹脂層が設けられた離型フィルムであって、樹脂層が、酸変性ポリオレフィン樹脂100質量部と、架橋剤1~20質量部と、ケン化率が99%以下であるポリビニルアルコール10~1000質量部とを含むことを特徴とする離型フィルム。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)