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1. (WO2018056039) SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Pub. No.:    WO/2018/056039    International Application No.:    PCT/JP2017/031798
Publication Date: Fri Mar 30 01:59:59 CEST 2018 International Filing Date: Tue Sep 05 01:59:59 CEST 2017
IPC: H01L 21/027
H01L 21/304
Applicants: SCREEN HOLDINGS CO., LTD.
株式会社SCREENホールディングス
Inventors: HATANO, Akito
波多野 章人
HAYASHI, Toyohide
林 豊秀
GOHARA, Takayuki
郷原 隆行
TAKAHASHI, Hiroaki
高橋 弘明
SOTOKU, Kota
宗徳 皓太
Title: SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Abstract:
This substrate processing device comprises a support member, a hood, a gas supply unit, and a gas exhaust unit. The gas supply unit supplies a gas delivered from a gas supply opening to a space between an upper surface of a substrate and a ceiling surface from around the space. The gas exhaust unit discharges the gas between the upper surface of the substrate and the ceiling surface through a gas exhaust opening that is opened in the ceiling surface at a position opposing a center part of the upper surface of the substrate. The spacing between the upper surface of the substrate and the ceiling surface at the center part of the upper surface of the substrate is smaller than the spacing between the upper surface of the substrate and the ceiling surface at an outer peripheral part of the upper surface of the substrate.