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1. (WO2018055744) LASER DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
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Pub. No.: WO/2018/055744 International Application No.: PCT/JP2016/078074
Publication Date: 29.03.2018 International Filing Date: 23.09.2016
IPC:
H05G 2/00 (2006.01) ,G03F 7/20 (2006.01) ,H01S 3/00 (2006.01) ,H01S 3/10 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
10
Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
Applicants:
ギガフォトン株式会社 GIGAPHOTON INC. [JP/JP]; 栃木県小山市大字横倉新田400番地 400, Oaza Yokokurashinden, Oyama-shi, Tochigi 3238558, JP
Inventors:
菅沼 崇 SUGANUMA, Takashi; JP
Agent:
松浦 憲三 MATSUURA, Kenzo; JP
Priority Data:
Title (EN) LASER DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
(FR) DISPOSITIF LASER, ET SYSTÈME DE GÉNÉRATION DE LUMIÈRE ULTRAVIOLETTE EXTRÊME
(JA) レーザ装置、及び極端紫外光生成システム
Abstract:
(EN) The laser device (200) according to an aspect of the present disclosure is a laser device (200) provided with one or more amplification units (204) for amplifying laser light emitted from a laser oscillator (202), and an amplification controller (218) for controlling the amplification unit (204), wherein: the amplification unit (204) is provided with an incidence-side optical adjustment unit provided with a wavefront adjustment unit (210) for adjusting the wavefront of the laser light and a first direction adjustment unit (212) for adjusting the optical axis of the laser light, an amplifier (214) which amplifies the laser light and which is disposed downstream of the incidence-side optical adjustment unit with respect to the direction of transmission of the laser light, an exit-side optical adjustment unit which is disposed downstream of the amplifier with respect to the direction of transmission of the laser light and which is provided with a second direction adjustment unit (215) for adjusting the optical axis of the laser light, and a measurement unit (216) which is disposed downstream of the exit-side optical adjustment unit with respect to the direction of the laser light and which measures the laser light to acquire information regarding the optical axis, wavefront, and/or energy of the laser light; and the amplification controller (218) controls the incidence-side optical adjustment unit and/or the exit-side optical adjustment unit on the basis of the result of the measurement by the measurement unit (216).
(FR) Le dispositif laser (200) selon un aspect de la présente invention est un dispositif laser (200) pourvu d'une ou de plusieurs unités d'amplification (204) pour amplifier la lumière laser émise par un oscillateur laser (202), et d'un dispositif de commande d'amplification (218) pour commander l'unité d'amplification (204), l'unité d'amplification (204) étant pourvue d'une unité de réglage optique côté incidence pourvue d'une unité de réglage de front d'onde (210) pour régler le front d'onde de la lumière laser et d'une première unité de réglage de direction (212) pour régler l'axe optique de la lumière laser, d'un amplificateur (214) qui amplifie la lumière laser et qui est disposé en aval de l'unité de réglage optique côté incidence par rapport à la direction de transmission de la lumière laser, d'une unité de réglage optique côté sortie qui est disposée en aval de l'amplificateur par rapport à la direction de transmission de la lumière laser et qui est pourvue d'une seconde unité de réglage de direction (215) pour régler l'axe optique de la lumière laser, et d'une unité de mesure (216) qui est disposée en aval de l'unité de réglage optique côté sortie par rapport à la direction de la lumière laser et qui mesure la lumière laser pour acquérir des informations concernant l'axe optique, le front d'onde et/ou l'énergie de la lumière laser ; et le dispositif de commande d'amplification (218) commandant l'unité de réglage optique côté incidence et/ou l'unité de réglage optique côté sortie sur la base du résultat de la mesure par l'unité de mesure (216).
(JA) 本開示の一観点に係るレーザ装置(200)は、レーザ発振器(202)から出射されたレーザ光を増幅する1つ以上の増幅ユニット(204)、及び増幅ユニット(204)を制御する増幅制御部(218)を備えたレーザ装置(200)であって、増幅ユニット(204)は、レーザ光の波面を調整する波面調整部(210)、及びレーザ光の光軸を調整する第1方向調整部(212)を備えた入射側光学調整部と、レーザ光の伝送方向の入射側光学調整部の下流側に配置され、レーザ光を増幅する増幅部(214)と、レーザ光の伝送方向の増幅部の下流側に配置され、レーザ光の光軸を調整する第2方向調整部(215)を備えた出射側光学調整部と、レーザ光の伝送方向の出射側光学調整部の下流側に配置され、レーザ光を計測して、レーザ光の光軸の情報、波面の情報、及びエネルギの情報の少なくともいずれか1つ取得する計測部(216)と、を備え、増幅制御部(218)は、計測部(216)の計測結果に基づいて入射側光学調整部、及び出射側光学調整部の少なくともいずれか一方を制御する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)