WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018054472) NOZZLE FOR A DISTRIBUTION ASSEMBLY OF A MATERIAL DEPOSITION SOURCE ARRANGEMENT, MATERIAL DEPOSITION SOURCE ARRANGEMENT, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/054472 International Application No.: PCT/EP2016/072578
Publication Date: 29.03.2018 International Filing Date: 22.09.2016
IPC:
C23C 14/12 (2006.01) ,C23C 14/24 (2006.01) ,C23C 14/56 (2006.01) ,C23C 16/455 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
12
Organic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Applicants: LOPP, Andreas[DE/DE]; DE (US)
HAAS, Dieter[DE/US]; US (US)
APPLIED MATERIALS, INC.[US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors: LOPP, Andreas; DE
HAAS, Dieter; US
Agent: ZIMMERMANN & PARTNER PATENTANWÄLTE MBB; Josephspitalstr. 15 80331 München, DE
Priority Data:
Title (EN) NOZZLE FOR A DISTRIBUTION ASSEMBLY OF A MATERIAL DEPOSITION SOURCE ARRANGEMENT, MATERIAL DEPOSITION SOURCE ARRANGEMENT, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL
(FR) BUSE DESTINÉE À UN ENSEMBLE DE DISTRIBUTION D'UN DISPOSITIF DE SOURCE DE DÉPÔT DE MATÉRIAU, DISPOSITIF DE SOURCE DE DÉPÔT DE MATÉRIAU, SYSTÈME DE DÉPÔT SOUS VIDE ET PROCÉDÉ DE DÉPÔT DE MATÉRIAU
Abstract:
(EN) A nozzle (100) for being connected to a distribution assembly for guiding evaporated material from a material source into a vacuum chamber is described. The nozzle includes: a nozzle inlet (110) for receiving the evaporated material; a nozzle outlet (120) for releasing the evaporated material to the vacuum chamber; and a nozzle passage (130) extending from the nozzle inlet (110) to the nozzle outlet (120) in a flow direction (111), wherein the nozzle passage (130) comprises an outlet section (131) having an aperture angle (a) which continuously increases in the flow direction (111). Further, a material deposition arrangement having such a nozzle, a vacuum deposition system with the material source arrangement, and a method for depositing evaporated material are provided.
(FR) L'invention concerne une buse (100) devant être reliée à un tuyau de distribution pour guider un matériau évaporé depuis une source de matériau jusqu'à une chambre à vide. La buse comporte : une entrée de buse (110) pour recevoir le matériau évaporé ; une sortie de buse (120) pour libérer le matériau évaporé vers la chambre à vide ; et un passage de buse (130) s'étendant depuis l'entrée de buse (110) jusqu'à la sortie de buse (120) dans un sens d'écoulement (111), le passage de buse (130) comprenant une partie de sortie (131) possédant un angle d'ouverture (a) qui augmente en continu dans le sens d'écoulement (111). En outre, l'invention concerne un dispositif de source de matériau possédant cette buse, un système de dépôt par évaporation sous vide pourvu du dispositif de source de matériau, et un procédé de dépôt de matériau évaporé.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)