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Pub. No.:    WO/2018/054223    International Application No.:    PCT/CN2017/100840
Publication Date: 29.03.2018 International Filing Date: 07.09.2017
A47B 21/013 (2006.01), A47B 21/04 (2006.01), A47B 21/02 (2006.01)
Applicants: HANGZHOU LIERKANG FURNITURE DESIGN CO. LTD. [CN/CN]; No. 168, Jianding Road, Jianggan District Hangzhou, Zhejiang 310021 (CN)
Inventors: XIANG, Chao; (CN)
Agent: TIANZHENG PATENT ATTORNEYS; WANG, Bing, 22F/B, Changdimingyuan No.9 Qingchun Road, Shangcheng District Hangzhou, Zhejiang 310009 (CN)
Priority Data:
201610835924.2 21.09.2016 CN
(ZH) 设备位置调节装置
Abstract: front page image
(EN)An apparatus for adjusting a device position. A first top component (120) and a second top component (220) are installed on two lifting means (100, 200) respectively. The lifting means (100, 200) drive the first top component (120) and the second top component (220) to move along a vertical direction only. An angle between the first top component (120) and a horizontal bottom surface, and an angle between the second top component (220) and the horizontal bottom surface both remain unchanged. A support component (221) is secured on the lifting means (200). A tray (222) revolves about the support component (221) by means of a position adjustment mechanism, and an angle between the tray (222) and the horizontal bottom surface remains unchanged during revolution. A rotation trajectory of the tray (222) is a curve around the support component (221). The side of the second top component (220) distant from the first top component (120) is defined as a use side where a user is located when in use. The lowest point of the curve located at the use side is lower than the support component (221). A first locking means and a second locking means are further comprised. The first locking means and the second locking means are both connected to unlocking means (250, 260).
(FR)L'invention concerne un appareil pour ajuster la position d'un dispositif. Un premier composant supérieur (120) et un second composant supérieur (220) sont installés sur deux moyens de levage (100, 200) respectivement. Les moyens de levage (100, 200) entraînent le premier composant supérieur (120) et le second composant supérieur (220) à se déplacer le long d'une direction verticale uniquement. Un angle entre le premier composant supérieur (120) et une surface inférieure horizontale et un angle entre le second composant supérieur (220) et la surface inférieure horizontale restent tous les deux inchangés. Un composant de support (221) est fixé sur le moyen de levage (200). Un plateau (222) tourne autour du composant de support (221) au moyen d'un mécanisme d'ajustement de position, et un angle entre le plateau (222) et la surface inférieure horizontale reste inchangé pendant la révolution. Une trajectoire de rotation du plateau (222) est une courbe autour du composant de support (221). Le côté du second composant supérieur (220) éloigné du premier composant supérieur (120) est défini comme un côté d'utilisation où l'utilisateur se situe lors de l'utilisation. Le point le plus bas de la courbe se trouvant du côté d'utilisation est inférieur au composant de support (221). Un premier moyen de verrouillage et un second moyen de verrouillage sont en outre inclus. Le premier moyen de verrouillage et le second moyen de verrouillage sont tous deux reliés à des moyens de déverrouillage (250, 260).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)