Mobile |
Deutsch |
Español |
Français |
日本語 |
한국어 |
Português |
Русский |
中文 |
العربية |
PATENTSCOPE
Search International and National Patent Collections
Options
Query
Result
Interface
Office
Translate
«
↓
»
Query Language
All
English
Hebrew
Korean
Spanish
Vietnamese
Arabic
Estonian
Indonesian
Polish
Swedish
Chinese
French
Italian
Portuguese
Swedish
Danish
German
Japanese
Russian
Thai
Stem
Sort by:
Relevance
Pub Date Desc
Pub Date Asc
App Date Desc
App Date Asc
List Length
10
50
100
200
Result List Language
Query Language
Vietnamese
German
Italian
Arabic
Swedish
English
Hebrew
Japanese
Polish
Estonian
Spanish
Portuguese
Russian
Danish
Indonesian
Korean
French
Chinese
Swedish
Thai
Displayed Fields
Application Number
Abstract
Int. Class
Inventor Name
Publication Date
Applicant Name
Image
Chart/Graph
Table
Graph
Group by
None
IPC code
Inventors
Publication Dates
Offices of NPEs
Applicants
Filing Dates
Countries
No of Items/Group
0
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17
18
19
20
21
22
23
24
25
Download Fields
NPEs
Default Search Form
Simple
Advanced Search
Field Combination
Browse by Week (PCT)
Cross Lingual Expansion
Translator
Default Tab Search Form
Front Page
Any Field
Full Text
ID/Numbers
IPC
Names
Dates
Interface Language
English
Deutsch
Français
Español
日本語
中文
한국어
Português
Русский
Skins
Default
Plain
Blue_Sky
Classic
Deep_Marine
Emerald_Town
Japan_Cherry
Ruby
Wine
Multiple Windows Interface
Tooltip Help
IPC Tooltip Help
Office:
All
All
PCT
Africa
ARIPO
Egypt
Kenya
Morocco
Tunisia
South Africa
Americas
United States of America
Canada
LATIPAT
Argentina
Brazil
Chile
Colombia
Costa Rica
Cuba
Dominican Rep.
Ecuador
El Salvador
Guatemala
Honduras
Mexico
Nicaragua
Panama
Peru
Uruguay
Asia-Europe
Australia
Bahrain
China
Denmark
Estonia
Eurasian Patent Office
European Patent Office
France
Germany
Germany(DDR data)
Israel
Japan
Jordan
Portugal
Russian Federation
Russian Federation(USSR data)
Saudi Arabia
United Arab Emirates
Spain
Republic of Korea
India
United Kingdom
Georgia
Asean
Singapore
Viet Nam
Indonesia
Cambodia
Malaysia
Brunei Darussalam
Philippines
Thailand
WIPO translate (Wipo internal translation tool)
Search
Simple
Advanced Search
Field Combination
Cross Lingual Expansion
Browse
Browse by Week (PCT)
Gazette Archive
Download National Phase Entries
Sequence listing
IPC Green Inventory
Portal to patent registers
Translate
WIPO Translate
WIPO Pearl
Options
Sort
Graph
Show Options
News
PATENTSCOPE News
Login
Login
Account Sign Up
Help
How to Search
User Guide PATENTSCOPE
User Guide: Cross Lingual Expansion
User Guide: ChemSearch
Query Syntax
Fields Definition
Country Code
Data Coverage
PCT applications
PCT national phase entry
National collections
Global Dossier public
FAQ
Feedback&Contact
INID codes
Kind codes
Tutorials
About
Overview
Terms And Conditions
Disclaimer
Home
IP Services
PATENTSCOPE
Machine translation
Wipo Translate
Arabic
German
English
Spanish
French
Japanese
Korean
Portuguese
Russian
Chinese
Google Translate
Bing/Microsoft Translate
Baidu Translate
Arabic
English
French
German
Spanish
Portuguese
Russian
Korean
Japanese
Chinese
...
Italian
Thai
Cantonese
Classical Chinese
1. (WO2018052062) MAGNETORESISTANCE EFFECT DEVICE AND MAGNETORESISTANCE EFFECT MODULE
PCT Biblio. Data
Full Text
National Phase
Notices
Drawings
Documents
«
↓
»
Latest bibliographic data on file with the International Bureau
⇨
Submit observation
PermaLink
PermaLink
Bookmark
Pub. No.:
WO/2018/052062
International Application No.:
PCT/JP2017/033208
Publication Date:
22.03.2018
International Filing Date:
14.09.2017
IPC:
H01L 29/82
(2006.01),
H01L 43/08
(2006.01)
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29
Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof
66
Types of semiconductor device
82
controllable by variation of the magnetic field applied to the device
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
43
Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
08
Magnetic-field-controlled resistors
Applicants:
TDK CORPORATION
[JP/JP]; 3-9-1, Shibaura, Minato-ku, Tokyo 1080023 (JP)
Inventors:
SUZUKI Tsuyoshi
; (JP)
Agent:
TANAI Sumio
; (JP).
ARA Norihiko
; (JP).
IIDA Masato
; (JP).
OGINO Akihiro
; (JP)
Priority Data:
2016-179124
14.09.2016
JP
Title
(EN)
MAGNETORESISTANCE EFFECT DEVICE AND MAGNETORESISTANCE EFFECT MODULE
(FR)
DISPOSITIF À EFFET DE MAGNÉTORÉSISTANCE ET MODULE À EFFET DE MAGNÉTORÉSISTANCE
(JA)
磁気抵抗効果デバイスおよび磁気抵抗効果モジュール
Abstract:
(EN)
Provided is a magnetoresistance effect device (1000) including: a first magnetoresistance effect element (101) including a first ferromagnetic layer (102), a second ferromagnetic layer (104), and a first spacer layer (103); a metal layer (111); a first electrode (107); an input terminal (108); an output terminal (109); and a reference potential terminal (110), wherein the first ferromagnetic layer, the first spacer layer, the second ferromagnetic layer, and the first electrode are arranged in this order, the second ferromagnetic layer electrically contacts the first electrode, the first electrode is connected to an output terminal through which a high-frequency signal is output, the metal layer is connected to the input terminal and the reference potential terminal such that a high-frequency signal flowing from the input terminal to the metal layer flows to the reference potential terminal, and the first ferromagnetic layer electrically contacts the reference potential terminal and includes an application terminal (106) which applies a DC current or DC voltage to the first magnetoresistance effect element.
(FR)
L'invention concerne un dispositif à effet de magnétorésistance (1000) comprenant : un premier élément à effet de magnétorésistance (101) comprenant une première couche ferromagnétique (102), d'une seconde couche ferromagnétique (104), et d'une première couche d'espaceur (103) ; une couche métallique (111) ; une première électrode (107) ; une borne d'entrée (108) ; une borne de sortie (109) ; et une borne de potentiel de référence (110), la première couche ferromagnétique, la première couche d'espaceur, la seconde couche ferromagnétique, et la première électrode étant agencées dans cet ordre, la seconde couche ferromagnétique étant en contact électrique avec la première électrode, la première électrode étant connectée à une borne de sortie par l'intermédiaire de laquelle un signal haute fréquence est délivré en sortie, la couche métallique étant connectée à la borne d'entrée et à la borne de potentiel de référence de sorte qu'un signal haute fréquence circulant de la borne d'entrée vers la couche métallique circule vers la borne de potentiel de référence, et la première couche ferromagnétique étant en contact électrique avec la borne de potentiel de référence et comprenant une borne d'application (106) qui applique un courant continu ou une tension continue au premier élément à effet de magnétorésistance.
(JA)
第1の強磁性層(102)と第2の強磁性層(104)と第1のスペーサ層(103)とを有する第1の磁気抵抗効果素子(101)と,金属層(111)と,第1の電極(107)と,入力端子(108)と,出力端子(109)と,基準電位端子(110)とを有し,前記第1の強磁性層,前記第1のスペーサ層,前記第2の強磁性層および前記第1の電極はこの順で配置され,前記第2の強磁性層は前記第1の電極と電気的に接し,前記第1の電極は高周波信号を出力する出力端子に接続され,前記入力端子から前記金属層に流れる高周波信号が前記基準電位端子に流れるように,前記金属層は前記入力端子と前記基準電位端子に接続され,前記第1の強磁性層は前記基準電位端子と電気的に接し,前記第1の磁気抵抗効果素子に直流電流,もしくは直流電圧を印加するための印加端子(106)を備える磁気抵抗効果デバイス(1000)を提供する。
Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language:
Japanese (
JA
)
Filing Language:
Japanese (
JA
)