Search International and National Patent Collections
|1. (WO2018052028) COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMATION METHOD|
|Applicants:||MITSUBISHI GAS CHEMICAL COMPANY, INC.
|Title:||COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMATION METHOD|
The present invention provides a compound that is represented by formula (0). (In formula (0), RY is a C1-30 alkyl group or a C6-30 aryl group; RZ is a C1-60 N-valent group or a single bond; each RT is independently an optionally substituted C1-30 alkyl group, an optionally substituted C6-30 aryl group, an optionally substituted C2-30 alkenyl group, an optionally substituted C1-30 alkoxy group, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group, or a hydroxyl group, the alkyl group, the aryl group, the alkenyl group, and the alkoxy group optionally including an ether linkage, a ketone linkage, or an ester linkage, at least one RT being a hydroxyl group, and at least one RT being a C2-30 alkenyl group; X is an oxygen atom, a sulfur atom, a single bond, or the absence of a crosslink; each m is independently an integer from 0 to 9, at least one being an integer from 2 to 9 or at least two being integers from 1 to 9; N is an integer from 1 to 4, the structures inside the N [ ] being the same or different when N is 2 or greater; and each r is independently an integer from 0 to 2.)