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Pub. No.:    WO/2018/051882    International Application No.:    PCT/JP2017/032250
Publication Date: 22.03.2018 International Filing Date: 07.09.2017
H01M 4/38 (2006.01), H01G 9/12 (2006.01), H01M 2/12 (2006.01)
Applicants: NITTO DENKO CORPORATION [JP/JP]; 1-1-2,Shimohozumi,Ibaraki-shi, Osaka 5678680 (JP)
Inventors: FUJIWARA,Keiko; (JP).
ISHII,Kyoko; (JP).
FUKUOKA,Takahiro; (JP).
HARADA,Noriaki; (JP).
NAKAMURA,Tomohiro; (JP).
MASAKI,Shunsuke; (JP)
Agent: UNIUS PATENT ATTORNEYS OFFICE; First Shin-Osaka MT Bldg. 2nd Floor, 5-13-9 Nishinakajima, Yodogawa-ku, Osaka-shi, Osaka 5320011 (JP)
Priority Data:
2016-181983 16.09.2016 JP
2017-167297 31.08.2017 JP
(JA) 水素排出部品
Abstract: front page image
(EN)The purpose of the present invention is to provide a hydrogen discharge component which is not susceptible to decrease in the hydrogen permeability even if used for a long period of time. A hydrogen discharge component according to the present invention is provided with a hydrogen discharge film having a metal layer, and is additionally provided with an adsorbent on at least the hydrogen introduction surface side of the hydrogen discharge film, said adsorbent adsorbing a sulfur compound.
(FR)Le but de la présente invention est de fournir un composant de décharge d'hydrogène qui n'est pas susceptible de diminuer la perméabilité à l'hydrogène même s'il est utilisé pendant une longue période de temps. Un composant de décharge d'hydrogène selon la présente invention comprend un film de décharge d'hydrogène ayant une couche métallique, et comprend en plus un adsorbant sur au moins la surface latérale d'introduction d'hydrogène du film de décharge d'hydrogène, ledit adsorbant adsorbant un composé de soufre.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)