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1. (WO2018049160) GRAPHENE OXIDE ANTI-MICROBIAL ELEMENT
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/049160 International Application No.: PCT/US2017/050679
Publication Date: 15.03.2018 International Filing Date: 08.09.2017
IPC:
B01D 67/00 (2006.01) ,B01D 71/02 (2006.01) ,B01D 69/10 (2006.01) ,B01D 69/12 (2006.01) ,B01D 65/08 (2006.01) ,B01D 69/14 (2006.01) ,C08J 7/04 (2006.01) ,B01D 61/02 (2006.01)
Applicants: NITTO DENKO CORPORATION[JP/JP]; 1-2, Shimohozumi 1-chome, Ibaraki-shi Osaka, 567-8680, JP
Inventors: ZHENG, Shijun; US
HSIEH, Wanyun; US
KITAHARA, Isamu; US
ERICSON, John; US
KOBUKE, Makoto; JP
WANG, Peng; US
Agent: JOHNSON, Brent A.; US
ZHOU, Yuefen; US
Priority Data:
62/385,02508.09.2016US
Title (EN) GRAPHENE OXIDE ANTI-MICROBIAL ELEMENT
(FR) ÉLÉMENT ANTIMICROBIEN À BASE D'OXYDE DE GRAPHÈNE
Abstract: front page image
(EN) Described herein is a graphene material and polymer-based anti-microbial element that provides anti-microbial capabilities. Described is an element that can also comprise a support. Also described is an element where the support can be the article to be protected from microbial buildup. Also described are methods for preventing microbial fouling by applying the aforementioned anti-microbial elements and related devices.
(FR) L'invention concerne un matériau de graphène et un élément antimicrobien à base de polymère qui fournit des capacités antimicrobiennes. L'invention concerne un élément qui peut également comprendre un support. L'invention concerne également un élément dans lequel le support peut être l'article à protéger contre l'accumulation microbienne. L'invention concerne également des procédés de prévention de l'encrassement microbien par l'application des éléments antimicrobiens susmentionnés ci-dessus et des dispositifs associés.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)