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1. (WO2018048254) ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREFOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/048254    International Application No.:    PCT/KR2017/009890
Publication Date: 15.03.2018 International Filing Date: 08.09.2017
IPC:
H01L 21/683 (2006.01), H01L 21/687 (2006.01), H01L 21/02 (2006.01), H05H 1/46 (2006.01), H01L 21/768 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US)
Inventors: CHO, Saeng Hyun; (KR)
Agent: NAM & NAM WORLD PATENT & LAW FIRM; (Seosomun-dong, KAL Bldg.) 3rd Fl., 117, Seosomun-ro Jung-gu Seoul 04515 (KR)
Priority Data:
10-2016-0115780 08.09.2016 KR
Title (EN) ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREFOR
(FR) MANDRIN ÉLECTROSTATIQUE ET SON PROCÉDÉ DE FABRICATION
(KO) 정전척 및 그 제조방법
Abstract: front page image
(EN)The present invention comprises: a base member (330) made of a metal material; and a dielectric layer (200) formed on the upper surface of the base member (330), and having electrode layers (340), formed therein, to which DC power is applied, wherein a dam part (310) for supporting the lower surface of the edge of a substrate (S) is formed on the upper surface of the dielectric layer (200), thereby lowering porosity of the dielectric layer and increasing lifespan, and enabling adhesion of the substrate to improve by increasing a dielectric constant.
(FR)La présente invention comprend : un élément de base (330) constitué d'un matériau métallique; et une couche diélectrique (200) formée sur la surface supérieure de l'élément de base (330) et possédant des couches d'électrode (340), formées en son sein, auxquelles une puissance en courant continu est appliquée, une partie de barrage (310) destinée à soutenir la surface inférieure du bord d'un substrat (S) étant formée sur la surface supérieure de la couche diélectrique (200), réduisant ainsi la porosité de la couche diélectrique et augmentant la durée de vie, et permettant que l'adhérence du substrat soit améliorée au moyen de l'augmentation d'une constante diélectrique.
(KO)본 발명은 금속재질의 베이스부재(330)와, 상기 베이스부재(330)의 상면에 형성되며, 내부에 DC전원이 인가되는 전극층(340)이 형성된 유전체층(200)을 포함하며, 기판(S)의 가장자리의 저면을 지지하는 댐부(310)가 상기 유전체층(200)의 상면에 형성함으로써 유전체층의 기공율을 낮추어 수명을 높이고, 유전율을 높여 기판에 대한 흡착력을 향상시킬 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)