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1. (WO2018047104) PHOTOSYNTHETIC AND HEAT STRESS TRAIT IMPROVEMENT I
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/047104    International Application No.:    PCT/IB2017/055420
Publication Date: 15.03.2018 International Filing Date: 08.09.2017
IPC:
A01N 63/02 (2006.01), A01P 21/00 (2006.01)
Applicants: KOCH BIOLOGICAL SOLUTIONS, LLC [US/US]; 3935 Point Eden Way Hayward, California 94545 (US)
Inventors: ARMSTRONG, Joshua; (US).
REPETTI, Peter; (US).
HOLTAN, Hans; (US).
KRUSE, John; (US)
Agent: MACKENZIE, Stephen; (US)
Priority Data:
62/385,643 09.09.2016 US
Title (EN) PHOTOSYNTHETIC AND HEAT STRESS TRAIT IMPROVEMENT I
(FR) AMÉLIORATION D'UNE CARACTÉRISTIQUE DE STRESS PHOTOSYNTHÉTIQUE ET THERMIQUE
Abstract: front page image
(EN)Compositions and methods for improving plant performance, productivity, and/or yield are disclosed herein. The compositions are obtained in part from a microbial culture, and methods of using these compositions to enhance photosynthetic rate and/or a heat stress trait, thereby improving plant performance, productivity, and/or yield, are also disclosed.
(FR)L'invention concerne des compositions et des procédés pour améliorer la performance, la productivité et/ou le rendement de plantes. Ces compositions sont obtenues en partie à partir d'une culture microbienne. Elle concerne des méthodes d'utilisation de ces compositions pour améliorer la vitesse de photosynthèse et/ou une caractéristique de stress thermique, et améliorer ainsi les performances, la productivité et/ou le rendement de la plante.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)