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1. (WO2018045197) ENDPOINT DETECTION ALGORITHM FOR ATOMIC LAYER ETCHING (ALE)

Pub. No.:    WO/2018/045197    International Application No.:    PCT/US2017/049663
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Fri Sep 01 01:59:59 CEST 2017
IPC: H01L 21/66
H01L 21/3065
Applicants: TOKYO ELECTRON LIMITED
TOKYO ELECTRON U.S. HOLDINGS, INC.
Inventors: CHEN, Yan
TIAN, Xinkang
FERNS, Jason
Title: ENDPOINT DETECTION ALGORITHM FOR ATOMIC LAYER ETCHING (ALE)
Abstract:
Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption - step process, a desorption - step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.